Abstract: A substrate handling system is provided with a robot having the dual function of a removing and replacing substrate-containing pod doors and load lock chamber doors, and of transporting the substrates between the pods and various processing stations. The robot is equipped with an end effector having sockets into which interchangeable tools for implementing the various functions are removably mounted. The tools are retrieved from respective parking locations disposed within the system micro environment, and automatic interchangeability of the tools is facilitated by a novel socket mechanism which engages and disengages the tools to the robot arm without introducing contaminants into the micro environment.

Abstract: An improvement is set forth in a robotic arm structure which includes at least two links. .theta. motion is provided about a primary axis at the proximal end portion of the proximalmost of the links. R motion proceeds radially from the primary axis whereby the distal end portion of the distalmost of the links can be moved in a radially extending straight line. At least two independent end effectors are pivotally mounted for rotation relative to the distal end portion of the distalmost link about an end effector axis which is parallel to the primary axis. The structure is improved by adding independent yaw motors for rotating the end effectors independently.

Abstract: A uni-directional tilt mechanism for supporting a robotic arm mechanism or other structures includes a simplified system of two motors for tilting a support platform in one dimension. The uni-directional tilt platforms according to the invention may be stacked to provide a universally tiltable stacked platform system for supporting a robotic arm mechanism. The multi-directional tilt stacked platform system can be used to align a Z-axis of a transferred substrate with cassettes or workstations in which substrate is to be placed by the robot.

Abstract: A planarity teaching station includes one or more proximity sensors arranged to reflect light off a surface to determine a plane in which a substrate is positioned by a robotic arm. The plane of the substrate is then automatically adjusted by changing a Z-axis of a universally tiltable robot base or in another manner, based on the data provided by the planarity teaching station. The adjustment of the substrate or end effector plane allows substrates to be removed from and delivered to various cassettes and workstations of a substrate processing system without damage to the substrate caused by end effector misalignment.