Abstract: A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses.

Abstract: A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses.

Abstract: A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; providing a sheet of a material having a second CTE matching the first CTE; molding a layer of a polymeric material surrounding the sheet of material and having a surface in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface having a correspondence to the selected pattern.

Abstract: A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses.

Abstract: A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses.

Abstract: A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; providing a sheet of a material having a second CTE matching the first CTE; molding a layer of a polymeric material surrounding the sheet of material and having a surface in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface having a correspondence to the selected pattern.

Abstract: A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; providing a sheet of a material having a second CTE matching the first CTE; molding a layer of a polymeric material surrounding the sheet of material and having a surface in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface having a correspondence to the selected pattern.

Abstract: A method of manufacturing a stamper/imprinter for patterning of a recording medium via thermally assisted nano-imprint lithography, comprising steps of: providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; injection molding a layer of a polymeric material in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the topographically patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface including a plurality of projections and depressions with dimensions and spacings having a correspondence to the selected pattern to be formed in a surface of the medium.

Abstract: A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; providing a sheet of a material having a second CTE matching the first CTE; molding a layer of a polymeric material surrounding the sheet of material and having a surface in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface having a correspondence to the selected pattern.

Abstract: A method of manufacturing a magnetic recording medium comprises steps of providing a non-magnetic substrate for a magnetic recording medium, the substrate including at least one major surface; forming a layer of a sol-gel on the at least one major surface; forming a pattern, e.g., a servo pattern in an exposed surface of the layer of said sol-gel; and converting the layer of sol-gel to a glass or glass-like layer while preserving the pattern in an exposed surface of said glass or glass-like layer. Embodiments of the invention include magnetic media including a patterned glass or glass-like layer formed from a layer of a hydrophilic sol-gel with the pattern embossed therein by means of a stamper having a hydrophilic surface including a negative image of the pattern.

Abstract: A method of manufacturing a magnetic recording medium comprises steps of providing a non-magnetic substrate for a magnetic recording medium, the substrate including at least one major surface; forming a layer of a sol-gel on the at least one major surface; forming a pattern, e.g., a servo pattern in an exposed surface of the layer of said sol-gel; and converting the layer of sol-gel to a glass or glass-like layer while preserving the pattern in an exposed surface of said glass or glass-like layer. Embodiments of the invention include magnetic media including a patterned glass or glass-like layer formed from a layer of a hydrophilic sol-gel with the pattern embossed therein by means of a stamper having a hydrophilic surface including a negative image of the pattern.

Abstract: A method of manufacturing a magnetic recording medium comprises steps of providing a non-magnetic substrate for a magnetic recording medium, the substrate including at least one major surface; forming a layer of a sol-gel on the at least one major surface; forming a pattern, e.g., a servo pattern in an exposed surface of the layer of said sol-gel; and converting the layer of sol-gel to a glass or glass-like layer while preserving the pattern in an exposed surface of said glass or glass-like layer. Embodiments of the invention include magnetic media including a patterned glass or glass-like layer formed from a layer of a hydrophilic sol-gel with the pattern embossed therein by means of a stamper having a hydrophilic surface including a negative image of the pattern.

Abstract: A method of manufacturing a magnetic recording medium comprises steps of providing a non-magnetic substrate for a magnetic recording medium, the substrate including at least one major surface; forming a layer of a sol-gel on the at least one major surface; forming a pattern, e.g., a servo pattern in an exposed surface of the layer of said sol-gel; and converting the layer of sol-gel to a glass or glass-like layer while preserving the pattern in an exposed surface of said glass or glass-like layer. Embodiments of the invention include magnetic media including a patterned glass or glass-like layer formed from a layer of a hydrophilic sol-gel with the pattern embossed therein by means of a stamper having a hydrophilic surface including a negative image of the pattern.