Patents by Inventor Gene Mirro

Gene Mirro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230393220
    Abstract: A multilayer ceramic capacitor (MLCC) tester includes a power supply source and a station. The station can include at least one test head having a first contact and a second contact arranged and configured to simultaneously electrically connect to a common MLCC transported to a test site, and arc suppression source circuitry. The arc suppression source circuitry can be electrically connected between an output of the power supply source and the first contact, wherein the arc suppression source circuitry is configured to introduce an impedance to the electrical connection between the MLCC and the power supply source.
    Type: Application
    Filed: September 23, 2021
    Publication date: December 7, 2023
    Applicant: Electro Scientific Industries, Inc
    Inventors: Yonghang FU, Gene MIRRO, Juan HINOJOS, Aaron HUMPHREY, Kyle BALL, Jonathan DANDY, Gale STRANEY, Greg ERWIN
  • Patent number: 8624206
    Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.
    Type: Grant
    Filed: October 18, 2012
    Date of Patent: January 7, 2014
    Assignee: FEI Company
    Inventors: Tom Miller, Gene Mirro, Cornelis Sander Kooijman, Hendrik Jan de Vos
  • Patent number: 8314409
    Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.
    Type: Grant
    Filed: August 28, 2010
    Date of Patent: November 20, 2012
    Assignee: FEI Company
    Inventors: Tom Miller, Gene Mirro, Cornelis Sander Kooijman, Hendrik Jan de Vos
  • Publication number: 20110049382
    Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.
    Type: Application
    Filed: August 28, 2010
    Publication date: March 3, 2011
    Applicant: FEI COMPANY
    Inventors: Tom Miller, Gene Mirro, Cornelis Sander Kooijman, Hendrik Jan De Vos