Abstract: The present disclosure provides photoreceptors and methods for fabricating photoreceptors. Photoreceptor device surfaces and fabrication methods have been designed to suppress a “plywood effect.” One method includes providing a substrate, rotating the substrate, lathing the substrate with a cutting tool and a cutting fluid by at least one pass, cleaning the substrate to remove the cutting fluid, and depositing onto the substrate at least one layer.

Abstract: A process for preparing an imaging member includes applying an organic layer to an imaging member substrate, treating the organic layer and/or a backside of the substrate with a corona discharge effluent, and applying an overcoating layer to the organic layer and/or an anticurl backing layer to the backside of the substrate.

Abstract: A honing means produces sonic waves that suspend and propel a honing medium against a surface of a substrate. The honing medium impinges on the surface of the substrate and alters the substrate's surface roughness. The substrate and the honing means are positioned relative to each other to ensure substantial surface roughness uniformity.

Abstract: There is disclosed a method for depositing layered material onto a substrate including a layer formed from a coating solution, wherein the method comprises: (a) cleaning the substrate by dipping the substrate into and raising the substrate from a cleaning solvent selected from the group consisting of (i) a mixture comprising an alcohol and an alkane; and (ii) a liquid compatible with the coating solution; and (b) dipping the substrate subsequent to (a) into and raising the substrate from the coating solution, thereby depositing the layer on the substrate, wherein when the cleaning solvent is the liquid compatible with the coating solution, any cleaning solvent present on the substrate upon the dipping of the substrate into the coating solution fails to detrimentally affect the layer.

Abstract: A photoreceptor fabrication method involving a photoreceptor substrate having a metal surface, comprising etching the metal surface of the photoreceptor substrate with an etching solution and forming a metal oxide layer on the metal surface with the etching solution, wherein the etching of the metal surface and the forming of the metal oxide layer are conducted in the absence of an electric current.

Abstract: A method for producing a photoreceptor having a substrate subjected to a surface finishing treatment to result in a finished substrate surface, wherein the method includes:(a) analyzing the finished substrate surface by performing a first surface energy reading, a first ellipsometry reading, a first x-ray diffraction reading, and a first profilometry reading;(b) removing electrochemically via an alternating voltage or alternating current a portion of the finished substrate surface, thereby resulting in a cleaned substrate surface;(c) analyzing the cleaned substrate surface by performing a second surface energy reading, a second ellipsometry reading, a second x-ray diffraction reading, and a second profilometry reading, wherein the removing step (b) is accomplished to the extent that the second surface energy reading and the second ellipsometry reading are measurably changed from the first surface energy reading and the first ellipsometry reading, but the second x-ray diffraction reading and the second profilo

Abstract: A cleaning solution for cleaning substrates such as imaging member substrates includes a weak acid, borax or a polyphosphate, an oil-soluble surfactant, and a water-soluble surfactant such as a water-soluble polysorbate, a polyethylene/polypropylene copolymer or a mixture thereof. The cleaning solution increases the cleaning capability of a corresponding cleaning process, and also improves the efficiency of the cleaning process by avoiding the necessity of neutralization and waste treatment operations.

Abstract: An aqueous-based cutting fluid for machining photoreceptor substrates contains:(A) at least one antioxidant;(B) one or more surfactants, at least one of which is a polysiloxane surfactant;(C) at least one lubricant; and(D) water.The cutting fluid can also optionally contain one or more biocides. The cutting fluid is environmentally safe, non-toxic and biodegradable and can be removed in a postmachining cleaning process using only high quality distilled water.

Abstract: A method of rendering nonreflective an imaging member substrate, preferably a photoreceptor substrate, involves etching the substrate with(a) an effective amount of an etching agent at a temperature sufficient to effect etching of the substrate, wherein the etching agent comprises (i) high purity deionized water, (ii) a mixture of high purity deionized water and a mild acid or (iii) a mixture of high purity deionized water and a base; or(b) a combination of the etching agent (a) and modulating ultrasonic energy.This method renders the substrate clean, spotless, and pristine, and provides it with uniform surface roughness.

Abstract: A method of cleaning a substrate includes:(1) lathing a substrate surface with a cutting fluid composition containing (A) an antioxidant, (B) a surfactant, (C) a lubricant, and (D) water;(2) rinsing the lathed substrate surface with high quality deionized water having a resistivity of at least 2M ohm-cm;(3) immersing the rinsed lathed substrate surface in a bath of high quality deionized water having a resistivity of at least 2M ohm-cm; and(4) removing the substrate from the bath of deionized water at a rate low enough to prevent water droplets from forming on the substrate.