Patents by Inventor Geng-Sheng Lin

Geng-Sheng Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11963348
    Abstract: A method of making a ROM structure includes the operations of forming an active area having a channel, a source region, and a drain region; depositing a gate electrode over the channel; depositing a conductive line over at least one of the source region and the drain region; adding dopants to the source region and the drain region of the active area; forming contacts to the gate electrode, the source region, and the drain; depositing a power rail, a bit line, and at least one word line of the integrated circuit against the contacts; and dividing the active area with a trench isolation structure to electrically isolate the gate electrode from the source region and the drain region.
    Type: Grant
    Filed: August 10, 2022
    Date of Patent: April 16, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Geng-Cing Lin, Ze-Sian Lu, Meng-Sheng Chang, Chia-En Huang, Jung-Ping Yang, Yen-Huei Chen
  • Patent number: 11801481
    Abstract: Methods of fabricating a porous membrane are disclosed. The first method includes the following operations. A mesoporous silica thin film with perpendicular mesopore channels is grown on a polymer film. The mesoporous silica thin film and the polymer film are transferred onto a macroporous substrate, in which the polymer film is positioned between the macroporous substrate and the mesoporous silica thin film. The polymer film is removed to form the porous membrane. The second method includes the following operations. A polymer film is formed on a macroporous substrate, wherein the polymer film includes crosslinked polymers including cross-linked polystyrene, cross-linked polymethyl methacrylate, or a combination thereof. A mesoporous silica thin film with perpendicular mesopore channels is grown on the polymer film. The polymer film is removed to form the porous membrane.
    Type: Grant
    Filed: June 22, 2022
    Date of Patent: October 31, 2023
    Assignee: NATIONAL TAIWAN UNIVERSITY
    Inventors: Chung-Yuan Mou, Jingling Yang, Kuo-Lun Tung, Geng-Sheng Lin
  • Publication number: 20220331747
    Abstract: Methods of fabricating a porous membrane are disclosed. The first method includes the following operations. A mesoporous silica thin film with perpendicular mesopore channels is grown on a polymer film. The mesoporous silica thin film and the polymer film are transferred onto a macroporous substrate, in which the polymer film is positioned between the macroporous substrate and the mesoporous silica thin film. The polymer film is removed to form the porous membrane. The second method includes the following operations. A polymer film is formed on a macroporous substrate, wherein the polymer film includes crosslinked polymers including cross-linked polystyrene, cross-linked polymethyl methacrylate, or a combination thereof. A mesoporous silica thin film with perpendicular mesopore channels is grown on the polymer film. The polymer film is removed to form the porous membrane.
    Type: Application
    Filed: June 22, 2022
    Publication date: October 20, 2022
    Inventors: Chung-Yuan MOU, Jingling YANG, Kuo-Lun TUNG, Geng-Sheng LIN
  • Publication number: 20200047133
    Abstract: A porous membrane and a method for filtering a fluid including particles with the porous membrane are disclosed. The porous membrane includes a macroporous substrate and a mesoporous silica thin film (MSTF) with perpendicular mesopore channels. The MSTF is positioned on the macroporous substrate. The method includes passing the fluid including the particles through the porous membrane.
    Type: Application
    Filed: July 26, 2019
    Publication date: February 13, 2020
    Inventors: Chung-Yuan MOU, Jingling YANG, Kuo-Lun TUNG, Geng-Sheng LIN
  • Publication number: 20100046224
    Abstract: An illumination device includes a circuit board unit having positioning hole units corresponding respectively to LEDs mounted thereon. Each positioning hole unit includes a first positioning hole, and a second positioning hole having a diameter larger than that of the first positioning hole. A lamp seat has positioning post units corresponding respectively to the positioning hole units in the circuit board unit. Each positioning post unit includes a first positioning post, and a second positioning post having a width larger than that of the first positioning post. When the circuit board unit is mounted on the lamp seat, the first and second positioning posts of each positioning post unit respectively extend through and engage the first and second positioning holes of a corresponding positioning hole unit in the circuit board unit, thereby positioning the circuit board unit to the lamp seat.
    Type: Application
    Filed: November 5, 2009
    Publication date: February 25, 2010
    Applicant: MAXZONE VEHICHLE LIGHTING CORP.
    Inventor: Geng-Sheng Lin