Patents by Inventor Geoffrey Alan SCHULTZ
Geoffrey Alan SCHULTZ has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10642166Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: GrantFiled: July 22, 2019Date of Patent: May 5, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Güneş Nakíbo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
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Publication number: 20190346777Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: ApplicationFiled: July 22, 2019Publication date: November 14, 2019Applicants: ASML NETHERLANDS B. V., ASML HOLDING N. V.Inventors: Günes NAKÍBOGLU, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes BLOKS, Hakki Ergun CEKLI, Geoffrey Alan SCHULTZ, Laurentius Johannes Adrianus VAN BOKHOVEN, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Christopher Charles WARD
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Patent number: 10423081Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.Type: GrantFiled: December 2, 2015Date of Patent: September 24, 2019Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Thomas Venturino, Geoffrey Alan Schultz, Daniel Nicholas Galburt, Daniel Nathan Burbank, Santiago E. Delpuerto, Herman Vogel, Johannes Onvlee, Laurentius Johannes Adrianus Van Bokhoven, Christopher Charles Ward
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Patent number: 10394139Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: GrantFiled: March 8, 2017Date of Patent: August 27, 2019Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Güneş Nak{dot over (i)}bo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
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Publication number: 20190121248Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: ApplicationFiled: March 8, 2017Publication date: April 25, 2019Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Günes NAKIBOGLU, Lowell Lane BAKER, Ruud Hendrikus Martinus Johannes BLOKS, Hakki Ergün CEKLI, Geoffrey Alan SCHULTZ, Laurentius Johannes Adrianus VAN BOKHOVEN, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Christopher Charles WARD
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Publication number: 20170363973Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.Type: ApplicationFiled: December 2, 2015Publication date: December 21, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Thomas VENTURINO, Geoffrey Alan SCHULTZ, Daniel Nicholas GALBURT, Daniel Nathan BURBANK, Santiago E. DELPUERTO, Herman VOGEL, Johannes ONVLEE, Laurentius Johannes Adrianus VAN BOKHOVEN, Christopher Charles WARD
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Patent number: 9222847Abstract: In one embodiment of the present invention, there is provided a gas gauge for use in a vacuum environment having a measurement gas flow channel. The gas gauge may comprise a measurement nozzle in the measurement gas flow channel. The measurement nozzle may be configured to operate at a sonically choked flow condition of a volumetric flow being sourced from a gas supply coupled to the measurement gas flow channel. The gas gauge may further comprise a pressure sensor operatively coupled to the measurement gas flow channel downstream from the sonically choked flow condition of the volumetric flow to measure a differential pressure of the volumetric flow for providing an indication of a gap between a distal end of the measurement nozzle and a target surface proximal thereto.Type: GrantFiled: December 11, 2013Date of Patent: December 29, 2015Assignee: ASML Holding N.V.Inventor: Geoffrey Alan Schultz
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Publication number: 20150192856Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a cooling system and a heating system. The cooling system is configured to direct a gas flow along a first direction across a surface of the patterning device to remove heat from the patterning device prior to exposing the patterning device or during exposure of the patterning device. The heating system is configured to selectively heat areas on the surface of the patterning device prior to exposing the patterning device or during exposure of the patterning device. The selective heating and the heat removal achieve a substantially uniform temperature distribution in the patterning.Type: ApplicationFiled: March 18, 2015Publication date: July 9, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Johannes Onvlee, Christopher J. Mason, Earl William Ebert, JR., Peter A. Delmastro, Christopher Charles Ward, Thomas Venturino, Geoffrey Alan Schultz, Daniel Nathan Burbank
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Publication number: 20140096614Abstract: In one embodiment of the present invention, there is provided a gas gauge for use in a vacuum environment having a measurement gas flow channel. The gas gauge may comprise a measurement nozzle in the measurement gas flow channel. The measurement nozzle may be configured to operate at a sonically choked flow condition of a volumetric flow being sourced from a gas supply coupled to the measurement gas flow channel. The gas gauge may further comprise a pressure sensor operatively coupled to the measurement gas flow channel downstream from the sonically choked flow condition of the volumetric flow to measure a differential pressure of the volumetric flow for providing an indication of a gap between a distal end of the measurement nozzle and a target surface proximal thereto.Type: ApplicationFiled: December 11, 2013Publication date: April 10, 2014Applicant: ASML Holding N.V.Inventor: Geoffrey Alan SCHULTZ
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Patent number: 8675168Abstract: A gas gauge (100) is provided for use in a vacuum environment having a measurement gas flow channel (105). The gas gauge comprises a measurement nozzle (110) in the measurement gas flow channel (105). The measurement nozzle (110) is configured to operate at a sonically choked flow condition of a volumetric flow being sourced from a gas supply (120) coupled to the measurement gas flow channel (105). The gas gauge (100) further comprises a pressure sensor (127) operatively coupled to the measurement gas flow channel (105) downstream from the sonically choked flow condition of the volumetric flow to measure a differential pressure of the volumetric flow for providing an indication of a gap (130) between a distal end of the measurement nozzle (135) and a target surface (140) proximal thereto.Type: GrantFiled: February 17, 2009Date of Patent: March 18, 2014Assignee: ASML Holding N.V.Inventor: Geoffrey Alan Schultz
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Publication number: 20100309445Abstract: A gas gauge (100) is provided for use in a vacuum environment having a measurement gas flow channel (105). The gas gauge comprises a measurement nozzle (110) in the measurement gas flow channel (105). The measurement nozzle (110) is configured to operate at a sonically choked flow condition of a volumetric flow being sourced from a gas supply (120) coupled to the measurement gas flow channel (105). The gas gauge (100) further comprises a pressure sensor (127) operatively coupled to the measurement gas flow channel (105) downstream from the sonically choked flow condition of the volumetric flow to measure a differential pressure of the volumetric flow for providing an indication of a gap (130) between a distal end of the measurement nozzle (135) and a target surface (140) proximal thereto.Type: ApplicationFiled: February 17, 2009Publication date: December 9, 2010Inventor: Geoffrey Alan Schultz
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Publication number: 20100103399Abstract: A fluid assisted gas gauge coupled to a pressure sensor enables proximity measurements to be made with a high bandwidth. A two-chamber gas gauge, containing a gas-filled measurement chamber and a fluid-filled transfer chamber and a diaphragm separating the two chambers, exhausts gas onto the surface being measured, while the incompressible fluid transmits the pressure to a pressure sensor. By minimizing the gas volume of the gas gauge, the response time is enhanced. In addition, the incompressible fluid permits the pressure sensor to be remotely located from the point of measurement without sacrificing the response time performance. In an embodiment, a differential bridge version of the fluid assisted gas gauge reduces common mode effects.Type: ApplicationFiled: August 26, 2009Publication date: April 29, 2010Applicant: ASML Holding N.V.Inventors: Joseph H. LYONS, Geoffrey Alan SCHULTZ