Abstract: Microlens arrays (105) having high focusing efficiencies are provided. The high focusing efficiencies are achieved by accurately producing the individual microlenses making up the array at high fill factors. Arrays of positive microlenses are produced by forming a master having a concave surface-relief pattern (101) in a positive photoresist (21) using direct laser writing. Through this approach, the problems associated with the convolution of a finite laser beam with a desired profile for a microlens are overcome. The microlens arrays of the invention have focusing efficiencies of at least 75%.

Abstract: Microlens arrays (105) having high focusing efficiencies are provided. The high focusing efficiencies are achieved by accurately producing the individual microlenses making up the array at high fill factors. Arrays of positive microlenses are produced by forming a master having a concave surface-relief pattern (101) in a positive photoresist (21) using direct laser writing. Through this approach, the problems associated with the convolution of a finite laser beam with a desired profile for a microlens are overcome. The microlens arrays of the invention have focusing efficiencies of at least 75%.

Abstract: Centered monofacet deflector systems having a dipole laser beam scanning pattern (dual scanning beams which propagate in opposite directions) enables both the scan rate and the scan duty cycle of the scanning system to be doubled over deflectors which produce only one beam. The deflector may be a non-disc plane diffraction grating (NPDG) deflector or a dual reflecting cube (DRC) deflector having polarization sensitive beam splitting characteristics. The input beam polarization contains or is generated to contain orthogonally polarized components which are reflected or diffracted to produce one of the dual scanning beams and a transmitted beam through the element and retroreflected with the proper polarization to be deflected at the element to produce the other scanning beam thereby providing the capability of two simultaneous or sequential scan lines for every revolution of the deflector element.