Patents by Inventor Geoffrey G. Harris

Geoffrey G. Harris has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100007883
    Abstract: An ellipsometer is used to analyze each of a plurality of sample portions that each include a substrate portion with a coating portion thereon, the substrate portions corresponding to respective spaced portions of a part with a curved surface. For each sample portion, the analysis includes: directing onto the coating portion a beam of radiation that includes first and second components with different polarizations; detecting energy of each of the first and second components reflected by the sample portion; and generating data that includes, for each of a plurality of different wavelengths, information regarding a change caused by the sample portion to a relationship between the first and second components.
    Type: Application
    Filed: July 9, 2008
    Publication date: January 14, 2010
    Applicant: RAYTHEON COMPANY
    Inventors: Geoffrey G. Harris, Daniel B. Mitchell, Douglas J. Brown
  • Publication number: 20100009074
    Abstract: A workpiece support member can rotate about an axis relative to a source, and the source can emit a plume of coating material that flows toward the workpiece support member approximately parallel to the axis. A plume-influencing shield can rotate with the workpiece support member, and has a plurality of openings extending therethrough approximately parallel to the general direction of flow of the plume. According to a different aspect, a method involves: rotating a workpiece support member about an axis relative to a source; emitting from the source a plume of coating material that flows toward the workpiece support member approximately parallel to the axis; and influencing the plume with structure that includes a shield rotating with the workpiece support member, the shield having a plurality of openings extending therethrough approximately parallel to the general direction of flow of the plume.
    Type: Application
    Filed: July 9, 2008
    Publication date: January 14, 2010
    Applicant: RAYTHEON COMPANY
    Inventors: Daniel B. Mitchell, Douglas J. Brown, Geoffrey G. Harris
  • Publication number: 20100007963
    Abstract: A path of travel for radiation extends to one optical element, then to another optical element, and then away from the latter. One of the optical elements is respectively reflective and non-reflective to radiation above and below a first wavelength, and the other is respectively reflective and non-reflective to radiation below and above a second wavelength. According to a different aspect, a path of travel for radiation extends to one of first and second optical elements, then to the other optical element, and then away from the latter. The first optical element is reflective and non-reflective to radiation on respective sides of a first wavelength, and the second optical element is reflective and non-reflective to radiation on respective sides of a second wavelength. The first optical element can tilt in relation to the path of travel to change the first wavelength.
    Type: Application
    Filed: July 9, 2008
    Publication date: January 14, 2010
    Applicant: RAYTHEON COMPANY
    Inventors: Douglas J. Brown, Daniel B. Mitchell, Geoffrey G. Harris, William Conrad Stenton, Gerard M. Desroches
  • Publication number: 20090302206
    Abstract: A detector calibration reference is disposed along a path of travel for radiation that extends from a radiation source to a radiation detector. The detector calibration reference has mutually exclusive first and second portions that are offset in a direction transverse to the path of travel, the first portion being substantially opaque to radiation from the source, and the second portion being substantially transmissive to radiation from the source. The detector calibration reference is moved relative to the path of travel in a manner so that the first and second portions become successively aligned with the path of travel.
    Type: Application
    Filed: June 5, 2008
    Publication date: December 10, 2009
    Applicant: RAYTHEON COMPANY
    Inventors: Geoffrey G. Harris, Daniel B. Mitchell, Douglas J. Brown
  • Publication number: 20090294999
    Abstract: A method includes: providing an element having mutually exclusive first and second portions with an initial index of refraction; and applying energy to the first portion in a manner causing the index of refraction thereof to change by at least 0.05 in relation to the index of refraction of the second portion. According to one specific approach, the applied energy is laser energy.
    Type: Application
    Filed: May 29, 2008
    Publication date: December 3, 2009
    Applicant: RAYTHEON COMPANY
    Inventors: Daniel B. Mitchell, Geoffrey G. Harris, Douglas J. Brown
  • Patent number: 7626169
    Abstract: A detector calibration reference is disposed along a path of travel for radiation that extends from a radiation source to a radiation detector. The detector calibration reference has mutually exclusive first and second portions that are offset in a direction transverse to the path of travel, the first portion being substantially opaque to radiation from the source, and the second portion being substantially transmissive to radiation from the source. The detector calibration reference is moved relative to the path of travel in a manner so that the first and second portions become successively aligned with the path of travel.
    Type: Grant
    Filed: June 5, 2008
    Date of Patent: December 1, 2009
    Assignee: Raytheon Company
    Inventors: Daniel B. Mitchell, Geoffrey G. Harris, Douglas J. Brown
  • Publication number: 20090280244
    Abstract: One aspect involves: supporting a workpiece with workpiece support structure that includes spaced support parts, a support section supporting the support parts, and a workpiece holding adhesive on each support part, where the adhesives engage respective regions of a surface portion on the workpiece; and supplying a coating material toward a different surface portion of the workpiece. A different aspect involves: supporting a workpiece with workpiece support structure that includes a workpiece support member with a surface portion extending approximately parallel to a direction, and a workpiece support part having two adhesive portions that respectively engage the surface portion on the support member and a surface portion on the workpiece; and supplying a coating material in the direction, toward a different surface portion of the workpiece.
    Type: Application
    Filed: May 12, 2008
    Publication date: November 12, 2009
    Applicant: Raytheon Company
    Inventors: Daniel B. Mitchell, Anthony A. Light, Mark A. Handerek, Geoffrey G. Harris, Douglas J. Brown
  • Publication number: 20090258141
    Abstract: An apparatus includes a workpiece support, a source for emitting a plume of coating material that flows toward the workpiece support, and plume influencing structure between the source and the workpiece support. The plume influencing structure includes a shield with plural openings extending therethrough approximately parallel to a general direction of flow of the plume away from the source. According to a different aspect, a method includes emitting from a source a plume of coating material that flows toward a workpiece support, and adjusting the flow of the plume with a shield between the source and the workpiece support, the shield having plural openings extending therethrough approximately parallel to a general direction of flow of the plume.
    Type: Application
    Filed: April 10, 2008
    Publication date: October 15, 2009
    Applicant: RAYTHEON COMPANY
    Inventors: Daniel B. Mitchell, Geoffrey G. Harris, Douglas J. Brown
  • Publication number: 20090258151
    Abstract: A coating apparatus includes support structure supporting a workpiece support member for rotation about an axis, and a drive structure for rotating the support member. A source is spaced along an imaginary line from the support structure, and emits a plume of coating material that flows away from the source toward the support structure. The axis extends at an angle with respect to an imaginary plane perpendicular to the imaginary line. According to a different aspect, a coating method includes rotating a workpiece support member about an axis, and emitting a plume of coating material from a source that is spaced along an imaginary line from the support structure, the plume flowing away from the source toward the support structure. The axis extends at an angle to an imaginary plane that is perpendicular to the imaginary line.
    Type: Application
    Filed: April 10, 2008
    Publication date: October 15, 2009
    Applicant: RAYTHEON COMPANY
    Inventors: Daniel B. Mitchell, Geoffrey G. Harris, Douglas J. Brown
  • Publication number: 20090186159
    Abstract: An apparatus includes a workpiece support, a source that is spaced from the workpiece support and can emit a plume of coating material toward the workpiece support, and plume adjusting structure that, between the source and workpiece support, can influence a plume of material flowing from the source. A different aspect involves a method that includes emitting from a source a plume of coating material that flows toward a workpiece support, and adjusting, between the source and the workpiece support, a plume of material flowing from the source.
    Type: Application
    Filed: January 22, 2008
    Publication date: July 23, 2009
    Applicant: RAYTHEON COMPANY
    Inventors: Daniel B. Mitchell, Geoffrey G. Harris, Douglas J. Brown
  • Publication number: 20090014316
    Abstract: A deposition apparatus includes a deposition source that produces a deposition flow of a deposited material and has an evaporation source with a material to be deposited therein, and a sputtering source that produces sputtering ions directed at the material to be deposited in the evaporation source. A deposition target is in facing relationship to the deposition source. The sputtering source is operated simultaneously with the evaporation source.
    Type: Application
    Filed: July 9, 2007
    Publication date: January 15, 2009
    Applicant: Raytheon Company
    Inventors: Daniel B. Mitchell, Geoffrey G. Harris