Patents by Inventor Geoffrey Ryding
Geoffrey Ryding has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11968774Abstract: According to some embodiments, an electrostatic particle accelerator may include an assembly having a motor and support plate; an acceleration tube; one or more stage assemblies each having an alternator coupled to a common drive shaft, a power supply coupled to one of the plurality of electrodes, and an opening to receive a portion of the acceleration tube; a pressure vessel configured to enclose the acceleration tube when the pressure vessel is fastened to the support plate; and a circulator configured to pump high pressure gas into the pressure vessel. The acceleration tube can include an ion source, an extraction assembly, and a plurality of tube segments each having a plurality of electrodes and one or more power connectors attached to one of the electrodes.Type: GrantFiled: April 19, 2019Date of Patent: April 23, 2024Assignee: Neutron Therapeutics LLCInventors: William H. Park, Jr., Theodore H. Smick, Geoffrey Ryding, Ronald Horner
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Patent number: 11589452Abstract: The present disclosures relates to an ion beam assembly where a relatively small deflection angle (approximately 15° from the center of the beam line) is used in conjunction with two beam dumps located on either side of the beam. In some embodiments, the combination of the two beam dumps and the magnet assembly can provide an ion beam filter. In some embodiments, the resulting system provides a smaller, safer and more reliable ion beam. In some embodiments, the ion beam can be a proton beam.Type: GrantFiled: May 5, 2017Date of Patent: February 21, 2023Assignee: Neutron Therapeutics, Inc.Inventors: Geoffrey Ryding, Takao Sakase, William H. Park, Theodore H. Smick
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Publication number: 20210120660Abstract: According to some embodiments, an electrostatic particle accelerator may include an assembly having a motor and support plate; an acceleration tube; one or more stage assemblies each having an alternator coupled to a common drive shaft, a power supply coupled to one of the plurality of electrodes, and an opening to receive a portion of the acceleration tube; a pressure vessel configured to enclose the acceleration tube when the pressure vessel is fastened to the support plate; and a circulator configured to pump high pressure gas into the pressure vessel. The acceleration tube can include an ion source, an extraction assembly, and a plurality of tube segments each having a plurality of electrodes and one or more power connectors attached to one of the electrodes.Type: ApplicationFiled: April 19, 2019Publication date: April 22, 2021Applicant: Neutron Therapeutics, Inc.Inventors: William H. Park, JR., Theodore H. Smick, Geoffrey Ryding, Ronald Horner
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Publication number: 20200196428Abstract: The present disclosures relates to an ion beam assembly where a relatively small deflection angle (approximately 15° from the center of the beam line) is used in conjunction with two beam dumps located on either side of the beam. In some embodiments, the combination of the two beam dumps and the magnet assembly can provide an ion beam filter. In some embodiments, the resulting system provides a smaller, safer and more reliable ion beam. In some embodiments, the ion beam can be a proton beam.Type: ApplicationFiled: May 5, 2017Publication date: June 18, 2020Applicant: Neutron Therapeutics, Inc.Inventors: Geoffrey RYDING, Takao SAKASE, William H. PARK, Theodore H. SMICK
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Patent number: 9887066Abstract: A system for controlling a high-power ion beam is disclosed, such as for steering, measuring, and/or dissipating the beam's power. In one embodiment, the ion beam can be controlled by being imparted into a cylindrical tube (e.g., a faraday cup), and deflected to strike an interior tube wall at an angle, thereby increasing an impact area of the beam on the wall. By also rotating the deflected beam around a circumference of the interior wall, the impact area of the ion beam may be further increased, thereby absorbing (dissipating) the high-power ion beam on the wall. In another embodiment, the ion beam may be passed through first, second, and third adjustable magnetic rings. By adjusting a relative angle between the rings and a combined rotation angle of all of the rings, a deflected ion beam may be rotated around a circumference of the interior wall of a power-absorbing tube, accordingly.Type: GrantFiled: July 8, 2015Date of Patent: February 6, 2018Assignee: NEUTRON THERAPEUTICS INC.Inventors: Geoffrey Ryding, Takao Sakase, Theodore Smick
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Publication number: 20170178859Abstract: A system for controlling a high-power ion beam is disclosed, such as for steering, measuring, and/or dissipating the beam's power. In one embodiment, the ion beam can be controlled by being imparted into a cylindrical tube (e.g., a faraday cup), and deflected to strike an interior tube wall at an angle, thereby increasing an impact area of the beam on the wall. By also rotating the deflected beam around a circumference of the interior wall, the impact area of the ion beam may be further increased, thereby absorbing (dissipating) the high-power ion beam on the wall. In another embodiment, the ion beam may be passed through first, second, and third adjustable magnetic rings. By adjusting a relative angle between the rings and a combined rotation angle of all of the rings, a deflected ion beam may be rotated around a circumference of the interior wall of a power-absorbing tube, accordingly.Type: ApplicationFiled: July 8, 2015Publication date: June 22, 2017Inventors: Geoffrey Ryding, Takao Sakase, Theodore Smick
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Publication number: 20150262863Abstract: A compact electromagnetic system is disclosed that is capable of scanning an ion beam in two orthogonal directions (e.g., for semiconductor doping or hydrogen induced exfoliation). In particular, according to embodiments of the compact electromagnetic system, the steel yoke, pole pieces, and excitation coils for both the X and Y axis have been integrated into a common structure.Type: ApplicationFiled: March 13, 2015Publication date: September 17, 2015Inventors: William H. Park, Geoffrey Ryding
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Patent number: 8759803Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.Type: GrantFiled: January 16, 2014Date of Patent: June 24, 2014Assignee: GTAT CorporationInventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, Jr., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
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Publication number: 20140130741Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.Type: ApplicationFiled: January 16, 2014Publication date: May 15, 2014Applicant: GTAT CORPORATIONInventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, JR., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
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Patent number: 8723452Abstract: A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In an embodiment, direct connections are provided to gap electrodes from the stage points of a multistage Cockcroft Walton type voltage multiplier circuit. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.Type: GrantFiled: July 20, 2011Date of Patent: May 13, 2014Assignee: GTAT CorporationInventors: Geoffrey Ryding, Steven Richards, Paul Eide, Theodore H. Smick, Malcolm Barnett
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Patent number: 8633458Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.Type: GrantFiled: November 15, 2011Date of Patent: January 21, 2014Assignee: GTAT CorporationInventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, Jr., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
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Patent number: 8558486Abstract: A d.c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In embodiments, the individually regulated gap voltages are generated by electrically isolated alternators mounted on a common rotor shaft driven by an electric motor. Alternating power outputs from the alternators provide inputs to individual regulated d.c. power supplies to generate the gap voltages. The power supplies are electrically isolated and have outputs connected in series across successive pairs of accelerator electrodes. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.Type: GrantFiled: December 8, 2010Date of Patent: October 15, 2013Assignee: GTAT CorporationInventors: Theodore H. Smick, Geoffrey Ryding, William H. Park, Ronald Horner
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Publication number: 20130119263Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.Type: ApplicationFiled: November 15, 2011Publication date: May 16, 2013Applicant: Twin Creeks Technologies, Inc.Inventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, JR., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
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Patent number: 8437156Abstract: A voltage supply incorporates two voltage supplies connected in a mirror-image series arrangement to generate a DC voltage between the respective common terminals of the voltage supplies.Type: GrantFiled: August 6, 2009Date of Patent: May 7, 2013Assignee: GTAT CorporationInventors: Steven Richards, Geoffrey Ryding, Theodore Smick
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Patent number: 8426829Abstract: An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. The wafer carriers have wafer retaining fences formed as cylindrical rollers with axes in the respective wafer support planes of the wafer carriers. The cylindrical surfaces of the rollers provide wafer abutment surfaces which can move transversely to the wafer support surfaces so that no transverse loading is applied by the fences to wafer edges as the wafer is pushed against the heat sink by centrifugal force. The wafer support surfaces comprise layers of elastomeric material and the movable abutment surfaces of the fences allow even thermal coupling with the heat sink over the whole area of the wafer.Type: GrantFiled: September 30, 2010Date of Patent: April 23, 2013Assignee: GTAT CorporationInventors: William H Leavitt, Theodore H Smick, Joseph Daniel Gillespie, William H Park, Paul Eide, Drew Arnold, Geoffrey Ryding
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Publication number: 20130056655Abstract: An apparatus and a method of ion implantation using a rotary scan assembly having an axis of rotation and a periphery. A plurality of substrate holders is distributed about the periphery, and the substrate holders are arranged to hold respective planar substrates. Each planar substrate has a respective geometric center on the periphery. A beam line assembly provides a beam of ions for implantation in the planar substrates on the holders. The beam line assembly is arranged to direct said beam along a final beam path.Type: ApplicationFiled: September 7, 2011Publication date: March 7, 2013Applicant: TWIN CREEKS TECHNOLOGIES, INC.Inventors: Theodore Smick, Geoffrey Ryding, Takao Sakase, William Park, JR., Joseph Gillespie, Ronald Horner, Paul Eide
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Patent number: 8378317Abstract: An apparatus and a method of ion implantation using a rotary scan assembly having an axis of rotation and a periphery. A plurality of substrate holders is distributed about the periphery, and the substrate holders are arranged to hold respective planar substrates. Each planar substrate has a respective geometric center on the periphery. A beam line assembly provides a beam of ions for implantation in the planar substrates on the holders. The beam line assembly is arranged to direct said beam along a final beam path.Type: GrantFiled: September 7, 2011Date of Patent: February 19, 2013Assignee: GTAT CorporationInventors: Theodore Smick, Geoffrey Ryding, Takao Sakase, William Park, Jr., Joseph Gillespie, Ronald Horner, Paul Eide
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Patent number: 8324592Abstract: Multiple control electrodes are provided asymmetrically within the plasma chamber of an ion source at respective positions along the length of the plasma chamber. Biasing the control electrodes selectively can selectively enhance the ion extraction current at adjacent positions along the length of the extraction slit. A method of generating an ion beam is disclosed in which the strengths of the transverse electric fields at different locations along the length of the plasma chamber are controlled to modify the ion beam linear current density profile along the length of the slit. The method is used for controlling the uniformity of a ribbon beam.Type: GrantFiled: November 2, 2010Date of Patent: December 4, 2012Assignee: Twin Creeks Technologies, Inc.Inventors: Geoffrey Ryding, Drew Arnold, William H. Park, Ronald Horner
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Publication number: 20120291709Abstract: A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.Type: ApplicationFiled: July 26, 2012Publication date: November 22, 2012Applicant: Applied Materials, Inc.Inventors: Jacob Smith, ALEXANDER TAM, R. SURYANARAYANAN IYER, SEAN SEUTTER, BINH TRAN, NIR MERRY, ADAM BRAILOVE, ROBERT SHYDO, JR., ROBERT ANDREWS, FRANK ROBERTS, THEODORE SMICK, GEOFFREY RYDING
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Patent number: 8227768Abstract: An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.Type: GrantFiled: June 18, 2009Date of Patent: July 24, 2012Assignee: Axcelis Technologies, Inc.Inventors: Theodore Smick, Geoffrey Ryding, Ronald F. Horner, Paul Eide, Marvin Farley, Kan Ota