Abstract: An optical device which uses a heterojunction field effect detector (HFED) having wavelength selectivity through the use of ion-implantation, and a wavelength selective grating. The device incorporates a Grinsch layer structure with a single GaAs quantum well. The optical power from the lens couples into a guided mode. The absorbing region is the quantum well itself. In the operation of the HFED, a positive bias is applied to the gate, and the depleted GaAs quantum well below the gate absorbs the photons, generating electron-hole pairs. The photocarriers are separated by the electric field before recombination can occur. The photocurrent is then produced in the external circuit by appropriately biasing the device. For collecting the electrons, a positive bias is applied to both the source and drain contacts, which act as dual drain contacts. The holes are removed via the collector which is maintained at ground. To maximize the responsivity (i.e.

Abstract: An optoelectronic switching node is disclosed wherein two input optical beams can be switched in the sense that they can be regenerated in either one of two output spatial locations in response to input control signals. Each one of the input optical beams is coupled to a resonant cavity detector which generates a current when its corresponding optical beam impinges on its resonant cavity. Output optical beams are regenerated by two inversion channel lasers each one of which has emitter, source and sub-collector terminals and is bistable in the sense that it can be switched on and off by currents delivered into and taken out of its source terminal. Heterojunction field effect transistors are used to selectively couple the currents generated by the resonant cavity detectors to the source terminals of the lasers in order to turn them on.

Abstract: An optical switch comprises a heterojunction transistor having a source electrode, a gate, a mesa, and three self-aligned waveguides, the mesa being ion implanted and having a single quantum well under the gate electrode, the single quantum well being comprises of undoped, narrow bandgap material bound on both sides by regions p-doped, wide bandgap material, both of said p-doped regions have symmetrically graded bandgaps, being most narrow next to the quantum well and increasing out to a wide and constant value away from the quantum well. A highly n-doped and totally depleted charge sheet is placed in a wide bandgap material, very near the gate side of the quantum well heterojunction. The charge sheet serves to induce a voltage controllable inversion channel within the quantum well.

Abstract: A distributed feedback (DFB) laser for use in a bipolar field effect transistor laser (known as a BICFET laser) produces a single mode, stable, tunable laser. The single mode, stable, tunable characteristics of the laser are achieved by modifying the structure and operation of a previously disclosed high speed integrated heterojunction field-effect transistor laser by the inclusion of a grating in the n+ active regions to create a periodic refractive index profile. Independent operation of two n+ quantum wells provides frequency tuning through simultaneous and independent control of the mode spacing or mode frequency and the distributed feedback frequency.

Abstract: A high transconductance field effect transistor is realized by controlling the doping level in a conducting channel buried beneath a heterointerface. In one exemplary embodiment, a channel comprising an undoped, high mobility, narrow band gap quantum well in combination with an intermediate band gap layer is formed beneath a heterointerface. The heterojunction interface is between a wide band gap layer and the quantum well region. A charge sheet having the same conductivity type as the wide bandgap layer is formed near the heterointerface. Advantageously, the transconductance is enhanced by conduction in the undoped filled quantum well region.

Abstract: A quantum well laser exhibiting near ideal switching characteristics, high power conversion efficiency and, moreover, capable of utilizing the advantageous characteristics of a double heterostructure optoelectronic switch comprises a quantum well region disposed between carrier confinement regions. In particular, the interface between the qunatum well regioin and a confinement region is adapted to the formation of an inversion layer.

Abstract: A double heterostructure opto-electronic device capable of both electronic and photonic switching is described.

Abstract: A new solid state field effect bipolar device provides for high current gain and low input capacitance, while avoiding the "punch-through" effects that limit the downward scaling of conventional bipolar and field effect devices. The device typically comprises a metallic (e.g. a metal or silicide) emitter, which makes ohmic contact to a semi-insulator; a channel terminal which contacts an inversion layer formed at the interface between the semi-insulator and a semiconductor depletion region; and a collector, which is the semiconductor bulk. The novel device controls the flow of majority carriers from the emitter into the collector by the biasing action of charge in the inversion channel. The technique can be utilized in making a transistor, photodetector, thyristor, controlled optical emitter, and other devices.

Abstract: The present invention is embodied in a method of operating a dynamic random access memory (RAM) array having individual depletion mode metal-oxide-semiconductor (MOS) transistors as the memory cells. The cells can be programmed to two threshold states providing constant current sensing. Cell programming is by application of appropriate signals to the transistor gate electrode and source. Reading is accomplished by grounding the source and sensing current through the transistor. An intermediate voltage on the gate electrode prevents changes in the state of the cell.

Abstract: In a microelectronic, metal-oxide-semiconductor dynamic random access memory cell having an MOS capacitance signal storage region, leakage current has been found to have a critical dependence upon the voltage level at which the storage gate is operated (V.sub.STORE). The leakage rate undergoes a sharp transition to a low state below a certain critical V.sub.STORE. This transition is due to the shutting off of the leakage from the periphery and field region around the cell. Consequently, maximum refresh time is achieved by modifying the cell to permit operation of the storage gate below the critical voltage, which may be at or near ground level. For an n-channel cell, permanently shifting the flatband voltage at the silicon-oxide interface of the storage capacitor in the negative direction can generate a potential well for charge storage with a very small V.sub.STORE.