Abstract: A spiral phase plate, according to one embodiment, for generating a Laguerre Gaussian beam by reflecting an incident beam emitted from a light source, may comprise: a first quadrant area in which the step height increase rate per unit angle decreases progressively in one direction from the point with the lowest step height to the point with the highest step height; and a second quadrant area in which the step height increase rate per unit angle increases progressively in the one direction.

Abstract: The present invention relates a washing device and a method for fabricating the same which has good chemical resistance and can prevent a scratch from forming on a substrate. The washing device includes a substrate entry guide for making a substrate to enter in a right direction from an outside of the washing device, a foreign matter removal unit for receiving the substrate from the substrate entry guide unit and removing foreign matters from the substrate, a foreign matter washing unit for receiving the substrate from the foreign matter removal unit and washing remained foreign matters from the substrate, and a position control unit for controlling a position of the substrate moving out of the foreign matter washing unit, wherein the substrate entry guide, the foreign matter removal unit, the foreign matter washing unit, and the position control unit are formed of metallic porous material.

Abstract: A display device includes a display panel including an upper substrate and a lower substrate facing-coupled to a rear surface of the upper substrate, a backlight unit supplying light to the display panel, a cover member receiving the display panel and covering a side surface of the display panel, a guide frame supporting the display panel and guiding a position of the display panel and a position of the backlight unit, and an adhesive member injected between the guide frame and the display panel and coupling the guide frame and the display panel. The guide frame includes a horizontal part and a first prevention jaw formed to protrude from one end of the horizontal part, and preventing the adhesive member from being injected into the backlight unit when injecting the adhesive member.

Abstract: A display device includes a display panel including an upper substrate and a lower substrate facing-coupled to a rear surface of the upper substrate, a backlight unit supplying light to the display panel, a cover member receiving the display panel and covering a side surface of the display panel, a guide frame supporting the display panel and guiding a position of the display panel and a position of the backlight unit, and an adhesive member injected between the guide frame and the display panel and coupling the guide frame and the display panel. The guide frame includes a horizontal part and a first prevention jaw formed to protrude from one end of the horizontal part, and preventing the adhesive member from being injected into the backlight unit when injecting the adhesive member.

Abstract: A substrate cleaning apparatus includes: a substrate entering guide unit for entering a substrate from outside in a proper direction; a foreign material removing unit for receiving the substrate from the substrate entering guide unit and removing debris formed on the substrate; a foreign material cleaning unit for receiving the substrate from the foreign material removing unit and cleaning to remove debris remaining on the substrate; and a position controller for controlling the position of the substrate carried out of the foreign material cleaning unit, wherein the foreign material cleaning unit includes: a manifold including a plurality of deionized water holes, suction holes and air holes; and a porous cleaning plate combined to the manifold by an upper fastening screw including a through hole communicating with the plurality of deionized water holes and suction holes.

Abstract: A substrate cleaning apparatus includes: a substrate entering guide unit for entering a substrate from outside in a proper direction; a foreign material removing unit for receiving the substrate from the substrate entering guide unit and removing debris formed on the substrate; a foreign material cleaning unit for receiving the substrate from the foreign material removing unit and cleaning to remove debris remaining on the substrate; and a position controller for controlling the position of the substrate carried out of the foreign material cleaning unit, wherein the foreign material cleaning unit includes: a manifold including a plurality of deionized water holes, suction holes and air holes; and a porous cleaning plate combined to the manifold by an upper fastening screw including a through hole communicating with the plurality of deionized water holes and suction holes.

Abstract: The present invention relates a washing device and a method for fabricating the same which has good chemical resistance and can prevent a scratch from forming on a substrate. The washing device includes a substrate entry guide for making a substrate to enter in a right direction from an outside of the washing device, a foreign matter removal unit for receiving the substrate from the substrate entry guide unit and removing foreign matters from the substrate, a foreign matter washing unit for receiving the substrate from the foreign matter removal unit and washing remained foreign matters from the substrate, and a position control unit for controlling a position of the substrate moving out of the foreign matter washing unit, wherein the substrate entry guide, the foreign matter removal unit, the foreign matter washing unit, and the position control unit are formed of metallic porous material.

Abstract: A washing device capable of stably washing a substrate is disclosed. The washing device includes a substrate entry guiding unit which guides a substrate supplied from the outside to be entered in a correct direction, a dirt removing unit supplied with the substrate from the substrate entry guiding unit to remove dirt formed on the substrate, a dirt washing unit supplied with the substrate from the dirt removing unit to wash off residual dirt remaining on the substrate, and a position controlling unit controlling position of the substrate being discharged from the dirt washing unit.

Abstract: A heat exchange-type reactor includes a reaction chamber (1) having mounted therein a plurality of contact tubes (5) filled with a catalyst material; at least one shield plate (11) mounted within the reaction chamber to partition an inner space of the reaction chamber into at least two separate spaces (1d, 1e); a plurality of conduits (13, 15, 17, 19) having entrance (15a, 17a) and exit (13a, 17a) openings through which a heat transfer medium respectively enters and exits, and being mounted to an outer circumference of the reaction chamber (1) corresponding to the partitioned spaces (1d, 1e); and a heat exchange unit connected to the conduits (13, 15, 17, 19) to perform heat exchange of the heat transfer medium, in which the heat exchange unit includes a single heat exchanger that performs the exchange of heat of the heat transfer medium in accordance with the partitioned spaces.

Abstract: The present invention relates to a method for producing (meth)acrylic acid comprising a process of recovering (meth)acrylic acid as an aqueous (meth)acrylic acid from a (meth) acrylic acid-containing gas mixture produced by the catalytic gas phase oxidation of at least one reactant selected from the group consisting of propane, propylene, isobutylene and (meth) acrolein, and a system usable for the method.

Abstract: The present invention provides a process of producing unsaturated acids from unsaturated aldehydes by fixed-bed catalytic partial oxidation in a shell-and-tube heat exchanger-type reactor, as well as a shell-and-tube heat exchanger-type reactor for use in the process. In the invention, second-stage reaction zone of mainly producing unsaturated acids by the catalytic vapor phase oxidation of an unsaturated aldehyde-containing gas mixture produced in a first-stage reaction zone with molecular oxygen is divided into two or more shell spaces by at least one partition. Each of the divided shell spaces is filled with a heat transfer medium, and the heat transfer medium in each shell space is maintained at isothermal temperature or a temperature difference of 0-5° C. Also, in order to protect catalyst layers from a highly exothermic reaction, the process is performed at a limited temperature difference between the temperature at a hot spot and the temperature of the heat transfer medium.

Abstract: The present invention provides a process of producing unsaturated aldehydes and unsaturated acids from olefins by fixed-bed catalytic partial oxidation in a shell-and-tube heat exchanger-type reactor. In this process, the reactor comprises a first-step reaction zone of mainly producing the unsaturated aldehydes, a second-step reaction zone of mainly producing the unsaturated acids, or both the two zones. The first-step reaction zone is divided into two or more zones by a partition. Each of the divided shell spaces is filled with a heat transfer medium, and the heat transfer medium in each shell space is maintained at isothermal temperature or a temperature difference of 0-5° C. The temperatures of the heat transfer media in each of the divided shell spaces are set to increase in the moving direction of reactants. In order to facilitate the removal of heat generation at a location where the partition is placed, a reaction inhibition layer is disposed in the first-step reaction zone.

Abstract: The present invention relates to a facility parts cleaning solution for the processing of (meth)acrylic acid and/or (meth)acrylic esters and a cleaning method using the cleaning solution. An aqueous cleaning composition comprising 5 to 50 wt % of at least one alkali metal hydroxide selected from the group consisting of sodium hydroxide and potassium hydroxide, 0.01 to 1 wt % of a water-soluble amino acid, 0.001 to 0.05 wt % of N,N?-methylene bisacrylamide, and 0.001 to 0.05 wt % of azobisisobutyronitrile is used to clean facility parts for manufacturing (meth)acrylic acid and/or (meth)acrylic esters in order to easily remove polymers and deposits.

Abstract: The present invention relates to a facility parts cleaning solution for the processing of (meth)acrylic acid and/or (meth)acrylic esters and a cleaning method using the cleaning solution. An aqueous cleaning composition comprising 5 to 50 wt % of at least one alkali metal hydroxide selected from the group consisting of sodium hydroxide and potassium hydroxide, 0.01 to 1 wt % of a water-soluble amino acid, 0.001 to 0.05 wt % of N,N?-methylene bisacrylamide, and 0.001 to 0.05 wt % of azobisisobutyronitrile is used to clean facility parts for manufacturing (meth)acrylic acid and/or (meth)acrylic esters in order to easily remove polymers and deposits.

Abstract: A heat exchange-type reactor includes a reaction chamber (1) having mounted therein a plurality of contact tubes (5) filled with a catalyst material; at least one shield plate (11) mounted within the reaction chamber to partition an inner space of the reaction chamber into at least two separate spaces (1d, 1e); a plurality of conduits (13, 15, 17, 19) having entrance (15a, 17a) and exit (13a, 17a) openings through which a heat transfer medium respectively enters and exits, and being mounted to an outer circumference of the reaction chamber (1) corresponding to the partitioned spaces (1d, 1e); and a heat exchange unit connected to the conduits (13, 15, 17, 19) to perform heat exchange of the heat transfer medium, in which the heat exchange unit includes a single heat exchanger that performs the exchange of heat of the heat transfer medium in accordance with the partitioned spaces.