Patents by Inventor Georg Flatscher

Georg Flatscher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7312878
    Abstract: In a method for producing a scale in the form of a phase grating, the scale itself, and a position measuring device including the scale, the scale includes two reflection layers located at a distance from one another on either side of a spacer layer. The production of the scale includes the following steps: provision of a first reflection layer, which is unbroken over its entire surface and fulfils the relationship A=R/??3, where R represents the degree of reflection and ? represents the backscatter coefficient for electrons; application of the spacer layer to the first reflection layer; application of the second reflection layer to the spacer layer; and structuring of the second reflection layer by an electron beam lithography process.
    Type: Grant
    Filed: September 24, 2002
    Date of Patent: December 25, 2007
    Assignee: Dr. Johannes Heidenhain GmbH
    Inventors: Peter Speckbacher, Georg Flatscher
  • Publication number: 20050052743
    Abstract: In a method for producing a scale in the form of a phase grating, the scale itself, and a position measuring device including the scale, the scale includes two reflection layers located at a distance from one another on either side of a spacer layer. The production of the scale includes the following steps: provision of a first reflection layer, which is unbroken over its entire surface and fulfils the relationship A=R/??3, where R represents the degree of reflection and ? represents the backscatter coefficient for electrons; application of the spacer layer to the first reflection layer; application of the second reflection layer to the spacer layer; and structuring of the second reflection layer by an electron beam lithography process.
    Type: Application
    Filed: September 24, 2002
    Publication date: March 10, 2005
    Inventors: Peter Speckbacher, Georg Flatscher
  • Patent number: 6800404
    Abstract: A method for producing a self-supporting electron-optical transparent structure that includes multi-layer strips and recesses located between the multi-layer strips. The method includes applying a first layer to a second layer, presetting a pattern by exposing or irradiating the first layer and etching the pattern out of the first layer so that partial areas of the second layer are uncovered. The method further includes galvanically applying layers to the uncovered partial areas of the second layer so that multi-layer strips are formed thereon and an electron-optical transparent structure is formed and removing the electron-optical transparent structure off the second layer.
    Type: Grant
    Filed: July 31, 2002
    Date of Patent: October 5, 2004
    Assignee: Dr. Johannes Heidenhain GmbH
    Inventors: Peter Speckbacher, Georg Flatscher, Michael Allgäuer, Erich Bayer, Anton Sailer, Martin Ullrich
  • Publication number: 20040090677
    Abstract: A material measure in the form of an amplitude grating including a first reflecting layer, a second transparent layer and a third layer, which is partially transparent to light, the third layer comprising a measuring graduation, wherein the second layer is arranged between the first layer and the third layer.
    Type: Application
    Filed: August 7, 2003
    Publication date: May 13, 2004
    Inventors: Michael Allgauer, Georg Flatscher, Stefan Marchfelder
  • Patent number: 6671092
    Abstract: A reflective measuring scale graduation, as well as a method for manufacturing the same are described. The reflective measuring scale graduation includes first and second subdivisions having different reflection properties, which extend in at least one first direction on a reflecting substrate. The highly reflecting first subdivisions are made of a plurality of partial layers having different indices of refraction and function as an interference filter. The low reflecting second subdivisions are composed of at least one absorber layer on the substrate.
    Type: Grant
    Filed: March 8, 2001
    Date of Patent: December 30, 2003
    Assignee: Johannes Heidenhain GmbH
    Inventor: Georg Flatscher
  • Publication number: 20030036022
    Abstract: A method for producing a self-supporting electron-optical transparent structure that includes multi-layer strips and recesses located between the multi-layer strips. The method includes applying a first layer to a second layer, presetting a pattern by exposing or irradiating the first layer and etching the pattern out of the first layer so that partial areas of the second layer are uncovered. The method further includes galvanically applying layers to the uncovered partial areas of the second layer so that multi-layer strips are formed thereon and an electron-optical transparent structure is formed and removing the electron-optical transparent structure off the second layer.
    Type: Application
    Filed: July 31, 2002
    Publication date: February 20, 2003
    Inventors: Peter Speckbacher, Georg Flatscher, Michael Allgauer, Erich Bayer, Anton Sailer, Martin Ullrich
  • Patent number: 6445456
    Abstract: In a position measuring device, a scale is embodied as a phase grating on which several partial beams impinge and are diffracted and caused to interfere with each other in the scanning unit. The entry angle (&agr;) of the partial beams corresponds to the Littrow angle, so that the diffracted partial beams of ±1st diffraction order are diffracted at the same angle &bgr;=&agr;. The diffraction efficiency of the scale is particularly great if the flanks of the bars of the scales are at an angle of approximately 70° with respect to the measuring direction, i.e., if the bars and gaps are embodied to be trapezoidal in cross section.
    Type: Grant
    Filed: December 16, 1997
    Date of Patent: September 3, 2002
    Assignee: Dr. Johannas Heidenhain GmbH
    Inventors: Peter Speckbacher, Michael Allgäuer, Georg Flatscher, Anton Sailer, Walburga Kern
  • Publication number: 20010046055
    Abstract: In a position measuring device, a scale is embodied as a phase grating on which several partial beams impinge and are diffracted and caused to interfere with each other in the scanning unit. The entry angle (&agr;) of the partial beams corresponds to the Littrow angle, so that the diffracted partial beams of ±1st diffraction order are diffracted at the same angle &bgr;=&agr;. The diffraction efficiency of the scale is particularly great if the flanks of the bars of the scales are at an angle of approximately 70° with respect to the measuring direction, i.e., if the bars and gaps are embodied to be trapezoidal in cross section.
    Type: Application
    Filed: December 16, 1997
    Publication date: November 29, 2001
    Inventors: PETER SPECKBACHER, MICHAEL ALLGAUER, GEORG FLATSCHER, ANTON SAILER, WALBURGA KERN
  • Publication number: 20010021485
    Abstract: A reflective measuring scale graduation, as well as a method for manufacturing the same are described. The reflective measuring scale graduation includes first and second subdivisions having different reflection properties, which extend in at least one first direction on a reflecting substrate. The highly reflecting first subdivisions are made of a plurality of partial layers having different indices of refraction and function as an interference filter. The low reflecting second subdivisions are composed of at least one absorber layer on the substrate.
    Type: Application
    Filed: March 8, 2001
    Publication date: September 13, 2001
    Inventor: Georg Flatscher
  • Patent number: 5880882
    Abstract: A scale for opto-electrical linear or angular measuring systems. A gradation in the form of a phase grating is embodied on the scale and has alternating raised and stepped areas. A continuous compensating layer of chrome and on it a continuous highly reflective layer of titanium nitride are applied to one side of a step-like structured base body. The material and the layer thickness of the compensating layer is selected in such a way that it counteracts the mechanical stresses of the reflecting surface layer and thus, in the finished state of the scale, the deposited layers no longer exert stresses on the base body.
    Type: Grant
    Filed: December 13, 1996
    Date of Patent: March 9, 1999
    Assignee: Dr. Johannes Heidenhain GmbH
    Inventors: Dieter Michel, Georg Flatscher
  • Patent number: 5786931
    Abstract: The phase grating of the present invention includes a substrate with a reflective, continuous layer disposed thereon on which a structured spacer layer 3 of dielectric material is applied. To form a phase grating that can be used as a scale in photoelectric position measuring instruments, a further thin reflective surface layer is located solely on the reflective, continuous surfaces, parallel to the layer, of the structured spacer layer.
    Type: Grant
    Filed: April 8, 1996
    Date of Patent: July 28, 1998
    Assignee: Johannes Heidenhain GmbH
    Inventors: Peter Speckbacher, Georg Flatscher, Michael Allgauer, Erich Bayer, Erwin Spanner, Andreas Franz
  • Patent number: 4632059
    Abstract: An evaporator device system having an electron jet heating device for the vaporization of several materials onto a substrate in a vacuum chamber includes at least two crucibles for the reception of respective evaporation materials. These crucibles are concentrically arranged on a turntable. For the more uniform evaporation of the material, at least the crucible aligned with the electron jet is caused to rotate in the turntable during operation of the eletron jet heating device.
    Type: Grant
    Filed: September 5, 1985
    Date of Patent: December 30, 1986
    Assignee: Dr. Johannes Heidenhain GmbH
    Inventors: Georg Flatscher, Anton Beckerbauer
  • Patent number: 4522862
    Abstract: A recording medium with a multicolor high resolution pattern created by layer packs. Pattern-forming layers of the layer packs are successively applied by photolithographic means in a sequence corresponding to a color of the high resolution pattern. The pattern-forming layers of the layer packs are separate from one another on the substrate of the recording medium.The process for producing the recording medium includes applying a photoresist layer to a substrate and developing the photoresist. Pattern-forming layers are successively applied over the whole surface of the substrate in a sequence corresponding to a color. The remaining photoresist and the layers overlying it are removed to leave a sequence of pattern-forming layers on the substrate separate from any adjacent pattern-forming layers.
    Type: Grant
    Filed: November 30, 1982
    Date of Patent: June 11, 1985
    Assignee: Johannes Heidenhain GmbH
    Inventors: Erich Bayer, Anton Beckerbauer, Georg Flatscher, Martin Ullrich
  • Patent number: 4431695
    Abstract: A multi-color, high density recording medium including a substrate having at least two patterned interference filters formed thereon is described. Each of the filters transmits a different wavelength range of visible light and each of the filters comprises an unpatterned interference layer of an inorganic material which is substantially absorption-free in the visible wavelength range of the spectrum. At least one of the interference filters formed on the substrate comprises a first, unpatterned reflecting layer positioned on one side of the respective interference layer, and a second, patterned reflecting layer positioned on the other side of the respective interference layer, such that the pattern of only the first reflecting layer forms the pattern of the at least one interference filter.
    Type: Grant
    Filed: January 30, 1981
    Date of Patent: February 14, 1984
    Assignee: Dr. Johannes Heidenhain GmbH
    Inventor: Georg Flatscher