Abstract: The disclosure relates to a system for a chemical and/or electrolytic surface treatment of a substrate comprises a catholyte chamber, an anolyte chamber, a distribution body, and a catholyte outlet. The distribution body is arranged in the catholyte chamber and the catholyte chamber is separated from the anolyte chamber by means of a membrane, wherein the membrane is tilted relative to the distribution body. The distribution body comprises jet openings for distributing a catholyte onto the substrate to be treated and drain openings for draining the catholyte out of a reaction space between the distribution body and the substrate. The catholyte outlet is arranged at the catholyte chamber in an eccentric position.

Abstract: The disclosure relates to a substrate holder for holding a substrate in a chemical and/or electrolytic surface treatment of the substrate, a substrate handling system comprising a substrate holder and an immersion scanner unit and a use of a substrate holder for holding a substrate with a width in a range of 1000 to 3500 mm and a length in a range of 1000 to 4000 mm. The substrate holder for holding a substrate in a chemical and/or electrolytic surface treatment of the substrate comprises a substrate carrier and a power contact unit. The substrate carrier comprises a frame to carry the substrate. The power contact unit comprises a body, a plurality of main legs extending from the body at least partially along an edge of the substrate carrier and a plurality of side legs each arranged essentially perpendicular at one of the main legs to contact the substrate.

Abstract: The disclosure relates to a system for a surface treatment of a substrate with a liquid, comprising: a first substrate holder, a second substrate holder, a liquid dispensing unit, a treatment chamber, and control unit, wherein the first substrate holder is configured to hold the substrate, wherein the first substrate holder is moveable in the treatment chamber and configured to hand the substrate over to the second substrate holder, wherein the second substrate holder is rotatable and configured to hold the substrate during a rotation of the substrate in and relative to the treatment chamber, wherein the liquid dispensing unit is moveable relative to the second substrate holder and configured to dispense the liquid onto the substrate, and wherein the control unit is configured to control a rotational speed of the substrate, a position of the liquid dispensing unit and/or a dispense rate of the liquid.

Abstract: The disclosure relates to a distribution system for a process fluid for a chemical and/or electrolytic surface treatment of a substrate, comprising: a distribution body, and a substrate holder, wherein the substrate holder has a substrate holder length (L) and a substrate holder width (W) and is configured to hold the substrate to be treated, wherein the distribution body comprises several openings for a process fluid and/or an electric current, wherein the distribution body and the substrate holder are moveable relative to each other, wherein the distribution body has a distribution body length (l) and a distribution body width (w), and wherein the distribution body length (l) is smaller than the substrate holder length (L).

Abstract: The invention relates to a substrate holding and locking system for chemical and/or electrolytic surface treatment of a substrate in a process fluid and a corresponding method. The system comprises a first element, a second element, a reduced pressure holding unit and a magnetic locking unit. The first element and the second element are configured to hold the substrate between each other. The reduced pressure holding unit comprises a pump to reduce an interior pressure inside the substrate holding and locking system below atmospheric pressure. The magnetic locking unit is configured to lock the first element and the second element with each other. The magnetic locking unit comprises a magnet control and at least a magnet. The magnet is arranged at one of the first element and the second element. The magnet control is configured to control a magnetic force between the first element and the second element.

Abstract: The invention relates to a substrate holding and locking system for chemical and/or electrolytic surface treatment of a substrate in a process fluid and a corresponding method. The system comprises a first element, a second element, a reduced pressure holding unit and a magnetic locking unit. The first element and the second element are configured to hold the substrate between each other. The reduced pressure holding unit comprises a pump to reduce an interior pressure inside the substrate holding and locking system below atmospheric pressure. The magnetic locking unit is configured to lock the first element and the second element with each other. The magnetic locking unit comprises a magnet control and at least a magnet. The magnet is arranged at one of the first element and the second element. The magnet control is configured to control a magnetic force between the first element and the second element.

Abstract: A feeder apparatus including a frame, a tray on the frame, and a hopper on the frame with an interior for holding feed. The hopper may be positioned above the tray and have a dispensing opening in a lower end to dispense feed into the tray. The apparatus may include a feed flow control assembly extending from the tray into the hopper and including a closing member configured for at least partially restricting feed movement through the dispensing opening. The closing member may be mounted on the tray and positioned in the hopper above the opening to define a gap therebetween. The hopper may be mounted on the frame in a manner that permits adjustment of the proximity of the hopper to the tray to adjust a size of the gap between the closing member and the dispensing opening to control feed flow through the gap.

Abstract: A shelf bracket includes a metal rail member with two transversely spaced vertical slots and a bracket member for attachment to the rail member for extending generally outwardly from the rail member on which the shelf can rest. A pair of end tab portions of the bracket member pass through the slots with end edges at the tab portion butting against the rail member below the slot and the tab portions extending upwardly from the slot to engage the rear surface of the rail member above the slot.

Abstract: A concrete form panel system for the pouring of structural concrete panels having integrated furring strips for receiving fasteners includes a form panel body having top and bottom surfaces, opposing first and second ends, and opposing first and second sides. A longitudinally extending beam channel is formed through the top surface of the body from the first end to the second end and parallel to the first and second sides for housing a concrete beam. A furring strip longitudinally extends across the body between the first and the second ends and extends at least in part upwardly into the beam slot. The furring strip is provided with a lower fastener portion extending at least in part parallel to the bottom surface of the body.