Abstract: The invention relates to an electrode arrangement of an electrostatic deflection system for corpuscular beams comprising a plurality of electrodes adjacently arranged on opposing faces of said deflection system. At least one of two opposing electrodes on the opposing faces is provided with an individual potential supply. The portions of the faces between the electrodes in one line which are facing the corpuscular beam are electrically conductive. The inventive arrangement permits the control of one or a plurality of corpuscular beams simultaneously and/or individually, which considerably increases the output of an electron beam processing device.