Abstract: A method of configuring a transfer of an image of a patterning device pattern onto a substrate with a lithographic apparatus. The method includes determining an intermediate illumination arrangement parameter and an intermediate patterning device parameter by varying an initial illumination arrangement parameter and an initial patterning device parameter using a calibrated model until the calculated image of the pattern printed on the substrate is within predetermined specification; calculating a metric that represents a lithographic response of the printed pattern over a process range, where the pattern would be imaged with the intermediate illumination arrangement and patterning device parameters over the process range, and depending on a result of the metric, adjusting the initial patterning device and illumination arrangement parameters.

Abstract: A method for optimizing the optical transfer of a mask pattern onto a substrate using a lithographic apparatus, the lithographic apparatus including an illuminator configured to illuminate the mask pattern, the method including determining a plurality of illumination arrangements for a pupil plane of the illuminator, each of the plurality of illumination arrangements being determined to improve a respective lithographic performance response parameter when illuminating the mask pattern; and adjusting an intensity of a first illumination arrangement of the plurality of illumination arrangements relative to a second illumination arrangement of the plurality of illumination arrangements, the mask pattern to be illuminated with the first and second illumination arrangements. The mask pattern may be illuminated at least once for each of the first and second illumination arrangements or all at once with at least the first illumination arrangement and the second illumination arrangement.

Abstract: Reports are automatically generated based on data currently displayed in a user interface such as a transaction register. The report generation is unobtrusive, allowing the user to continue to work with the current portion of the user interface before, during, and after the report is displayed. The report generation is also context-driven, obtaining parameters used to construct the report from the current user context.

Abstract: A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation, the lithographic apparatus including an illuminator and a projection system, includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.

Abstract: A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation using isofocal compensation, the lithographic apparatus including an illuminator, a projection system and a mask having at least one pattern to be printed on a substrate. This method includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, calculating a metric representing variation of the separate responses for individual source points with defocus and adjusting an illumination arrangement based on analysis of the metric.

Abstract: A financial data management application sets up a placeholder entry for entered current holdings information in which all the historical transactions that led to the current holdings have not been accounted for. Backfill transactions may be entered later on to update the placeholder entry with all or part of the historical transactions that led to the current holdings. If a backfill transaction is entered, the placeholder entry is adjusted to reflect the backfill transaction.

Abstract: A guard for covering the union of two rotating drive shafts that are movable in a telescoping manner through a travel distance along a shaft axis includes inner, center and outer guard sleeves disposed about the shafts along the shaft axis. The sleeves are preferably cylindrical and concentric with the shaft axis. The center guard sleeve is radially disposed between the inner and outer guard sleeves in axially overlapping relation. A spring applies an axial force acting on the inner and center guard sleeves to maintain the overlap between the center guard sleeve and both of the inner and outer guard sleeves throughout the travel distance of the shafts. The center and inner guard sleeves are linked by a radial tab slideably retained in a slot in the inner guard sleeve.

Abstract: A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation using full resist calculation, the lithographic apparatus comprising an illuminator, a projection system, and a mask having a pattern to be printed in a layer of photoresist material formed on a substrate. This method includes defining a lithographic 0problem, which may include a lithographic pattern to be printed on a wafer; choosing a resist model of a resist process to be used to print a pattern in the layer of photoresist material; selecting a grid of source points in a pupil plane of the illuminator; calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the resist model; and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.

Abstract: A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation using isofocal compensation, the lithographic apparatus including an illuminator, a projection system and a mask having at least one pattern to be printed on a substrate. This method includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, calculating a metric representing variation of the separate responses for individual source points with defocus and adjusting an illumination arrangement based on analysis of the metric.

Abstract: A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation, the lithographic apparatus including an illuminator and a projection system, includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.

Abstract: A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation using full resist calculation, the lithographic apparatus comprising an illuminator, a projection system, and a mask having a pattern to be printed in a layer of photoresist material formed on a substrate. This method includes defining a lithographic problem, which may include a lithographic pattern to be printed on a wafer; choosing a resist model of a resist process to be used to print a pattern in the layer of photoresist material; selecting a grid of source points in a pupil plane of the illuminator; calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the resist model; and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.

Abstract: A user interface has a mini-program window display means, a launch selection area display means and an activating means. The mini-program window display means displays a plurality of mini-program windows within a first panel interface. Each mini-program window has a first background pattern. Each mini-program window represents a virtual computing screen. Mini-windows shown in the mini-program windows each represent an application window displayed in the represented virtual computing screen. The launch selection area display means displays a plurality of application launch selection areas within a second panel interface.

Abstract: A user interface has a main module and a plurality of panel modules. The main module presents the user interface on the display screen to a user. The plurality of panel modules are in communication with the main module. Each panel module presents a panel interface on the display screen to the user. Each panel module is individually configurable and each panel is configurable as part of the user interface presented by the main module.

Abstract: A user interface has a main module and a plurality of panel modules. The main module presents the user interface on the display screen to a user. The plurality of panel modules are in communication with the main module. Each panel module presents a panel interface on the display screen to the user. Each panel module is individually configurable and each panel module is configurable as part of the user interface presented by the main module. In the preferred embodiment, the displayed user interface and individual panel interfaces may be varied in size in two dimensions. The user interface can be displayed with a vertical or horizontal orientation. Also, a calendar and resource gauge with unique features are included among the panel interfaces.

Abstract: A dashboard interface includes a plurality of software buttons provided on a panel. Each software button represents one of a plurality of applications. Upon a user selecting a first software button, a first application represented by the first software button is started. Upon a user selecting and dragging a visual representation of a second application to the panel, a new software button representing the second application is added to the panel. Upon a user selecting a different software button size in a configuration menu, the size of each software button in the plurality of software buttons is changed. The plurality of applications are listed in a configuration menu. The order in which the plurality of software buttons is displayed on the panel reflects the order of the listing of the plurality of applications. Upon a user changing the order of the listing of the plurality of applications, the order in which the plurality of software buttons is displayed on the panel is changed.

Abstract: The present invention relates to the discovery of a new catalyst support and in methods for the preparation of olefinic oxidation products such as unsaturated acids, nitriles, and aldehydes. The novel support for the oxidation catalysts is expanded, crushed perlite, that is, volcanic glass which has been expanded to tiny hollow bubbles by heat which are then fractured. Perlite is a siliceous material largely of SiO.sub.2. Surprisingly, it is greatly superior to the commonly used amorphous, colloidal silica as a support, as well as to other known supports. The result is high productivity of desired products over a prolonged period of operation, high selectivity over a prolonged period of operation and prolonged life of the oxidation catalyst systems. The invention is preferably employed in the preparation of unsaturated aliphatic acids such as methacrylic acids and unsaturated aldehydes such as methacrolein by the oxidation of the appropriate aldehyde or olefin.