Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: A magnetization tool for post-assembly magnetization of a magnet assembly including a main coil, an end surface of the main coil configured to be positioned substantially parallel to an outer surface of the magnet assembly for magnetizing a magnetic pole of the magnet assembly, the main coil being configured to generate a magnetic field and a shielding arrangement positioned adjacent the main coil in a plane substantially parallel to the end surface of the main coil, whereby the shielding arrangement is configured to generate a shielding magnetic field, whereby a resulting magnetic field of the shielding magnetic field and the magnetic field is substantially only protruding the magnetic pole of the magnet assembly and directly adjacent magnetic poles of the magnet assembly such that the magnetic pole of the magnet assembly and the directly adjacent magnetic poles of the magnetic pole have a substantially opposite polarity.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: A magnetization tool for post-assembly magnetization of a magnet assembly including a main coil, an end surface of the main coil configured to be positioned substantially parallel to an outer surface of the magnet assembly for magnetizing a magnetic pole of the magnet assembly, the main coil being configured to generate a magnetic field and a shielding arrangement positioned adjacent the main coil in a plane substantially parallel to the end surface of the main coil, whereby the shielding arrangement is configured to generate a shielding magnetic field, whereby a resulting magnetic field of the shielding magnetic field and the magnetic field is substantially only protruding the magnetic pole of the magnet assembly and directly adjacent magnetic poles of the magnet assembly such that the magnetic pole of the magnet assembly and the directly adjacent magnetic poles of the magnetic pole have a substantially opposite polarity.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: A positioning device (11) comprises a stationary frame (2), and at least two scales (20, 30) for measuring the location of the platform with respect to the frame, the scales having mutually different pitches (P1; P2), and respective scanners (23, 33) providing respective scanner output signals (SM 1, SM2)—A controller (6) receiving both scanner output signals is capable to uniquely calculate the position (X) of the platform with respect to the frame in a measuring range (MR) that is larger than the largest of said two pitches (P1; P2).

Abstract: Positioning device having a first part (1) which is movable relative to a second part (2) in a X and Y-direction, said first part (1) comprising a carrier (5) on which a system of magnets (3) is arranged in a pattern of rows (7) and columns (8) parallel to the X- and Y-direction, respectively. The magnets in each row and column are arranged in a Halbach array, i.e. the magnetic orientation of each successive magnet in each row (7) and each column (8) is rotated through 90° counter-clockwise. The second part (2) comprises an electric coil system (4) with two types of electric coils (C1, C2), one type having an angular offset of +45° and the other type having an offset of ?45° with respect to the X-direction. The magnet configuration causes a very strong magnetic field.

Abstract: Positioning device having a first part (1) which is movable relative to a second part (2) in a X and Y-direction, said first part (1) comprising a carrier (5) on which a system of magnets (3) is arranged in a pattern of rows (7) and columns (8) parallel to the X- and Y-direction, respectively. The magnets in each row and column are arranged in a Halbach array, i.e. the magnetic orientation of each successive magnet in each row (7) and each column (8) is rotated through 90° counter-clockwise. The second part (2) comprises an electric coil system (4) with two types of electric coils (C1, C2), one type having an angular offset of +45° and the other type having an offset of −45° with respect to the X-direction. The magnet configuration causes a very strong magnetic field.

Abstract: Positioning device having a first part (1) which is movable relative to a second part (2) in a X and Y-direction, said first part (1) having a carrier (5) on which a system of magnets (3) is arranged in a pattern of rows (7) and columns (8) parallel to the X- and Y-direction, respectively. The magnets in each row and column are arranged in a Halbach array, i.e. the magnetic orientation of each successive magnet in each row (7) and each column (8) is rotated through 90° counter-clockwise. The second part (2) has an electric coil system (4) with two types of electric coils (C1, C2), one type having an angular offset of +45° and the other type having an offset of −45° with respect to the X-direction. The magnet configuration causes a very strong magnetic field.

Abstract: Positioning device having a first part (1) which is movable relative to a second part (2) in a X and Y-direction, said first part (1) comprising a carrier (5) on which a system of magnets (3) is arranged in a pattern of rows (7) and columns (8) parallel to the X- and Y-direction, respectively. The magnets in each row and column are arranged in a Halbach array, i.e. the magnetic orientation of each successive magnet in each row (7) and each column (8) is rotated through 90° counter-clockwise. The second part (2) comprises an electric coil system (4) with two types of electric coils (C1, C2), one type having an angular offset of +45° and the other type having an offset of −45° with respect to the X-direction. The magnet configuration causes a very strong magnetic field.