Patents by Inventor George Barclay

George Barclay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11927523
    Abstract: In flow cytometry, particles (2) can be distinguished between populations (8) by combining n-dimensional parameter data, which may be derived from signal data from a particle, to mathematically achieve numerical results representative of an alteration (48). An alteration may include a rotational alteration, a scaled alteration, or perhaps even a translational alteration. Alterations may enhance separation of data points which may provide real-time classification (49) of signal data corresponding to individual particles into one of at least two populations.
    Type: Grant
    Filed: July 11, 2022
    Date of Patent: March 12, 2024
    Assignee: Beckman Coulter, Inc.
    Inventors: George C. Malachowski, Paul Barclay Purcell, Edward Allan Stanton, Kenneth Michael Evans
  • Publication number: 20080032232
    Abstract: Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be effectively imaged with sub-200 nm radiation such as 193 nm radiation.
    Type: Application
    Filed: July 13, 2007
    Publication date: February 7, 2008
    Applicant: Shipley Company, L.L.C.
    Inventors: Young Bae, George Barclay
  • Publication number: 20070084732
    Abstract: Leveling agents for metal plating baths are provided. Plating baths containing such leveling agents provide metal deposits having substantially level surfaces. Such leveling agents may be selected to selectively incorporate desired levels of impurities into the metal deposit.
    Type: Application
    Filed: October 2, 2006
    Publication date: April 19, 2007
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Robert Mikkola, George Barclay
  • Publication number: 20060016693
    Abstract: Plating baths containing a mixture of leveling agents, where the mixture includes a first level agent having a first diffusion coefficient and a second leveling agent having a second diffusion coefficient, are provided. Such plating baths deposit a metal layer, particularly a copper layer, that is substantially planar across a range of electrolyte concentrations. Methods of depositing metal layers using such plating baths are also disclosed. These baths and methods are useful for providing a planar layer of copper on a substrate having small apertures, such as an electronic device.
    Type: Application
    Filed: July 16, 2005
    Publication date: January 26, 2006
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Robert Mikkola, Chunyi Wu, George Barclay
  • Publication number: 20050196699
    Abstract: New polymers are provided that contain both Ti and Si atoms and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Polymers of the invention are particularly useful as a resin component of photoresists imaged at short wavelengths such as sub-300 nm and sub-200 nm.
    Type: Application
    Filed: March 3, 2005
    Publication date: September 8, 2005
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Subbareddy Kanagasabapathy, George Barclay
  • Publication number: 20050170278
    Abstract: Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.
    Type: Application
    Filed: October 22, 2004
    Publication date: August 4, 2005
    Inventors: Charles Szmanda, George Barclay, Peter Trefonas, Wang Yueh
  • Publication number: 20050142486
    Abstract: The present invention relates to new polymers and use of such polymers as a resin binder component for photoresist compositions, particularly chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Preferred polymers of the invention are terpolymers and tetrapolymers that can exhibit good adhesion to underlying inorganic surfaces such as SiON and Si3N4 surfaces and contain repeat units with pendant moieties having heteroatom substitution.
    Type: Application
    Filed: December 30, 2004
    Publication date: June 30, 2005
    Inventors: Dong Chung, George Barclay
  • Publication number: 20050032373
    Abstract: New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.
    Type: Application
    Filed: April 9, 2004
    Publication date: February 10, 2005
    Inventors: James Cameron, Peter Trefonas, George Barclay, Jin Sung
  • Publication number: 20050026077
    Abstract: Disclosed are photoimageable compositions containing silsesquioxane binder polymers and photoactive compounds, methods of forming relief images using such compositions and methods of manufacturing electronic devices using such compositions. Such compositions are useful as photoresists and in the manufacture of optoelectronic devices.
    Type: Application
    Filed: August 23, 2004
    Publication date: February 3, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Dana Gronbeck, George Barclay, Leo Linehan, Kao Xiong, Subbareddy Kanagasabapathy
  • Patent number: 5344742
    Abstract: The present invention comprises certain benzyl-substituted photoactive compounds and photoresist compositions comprising such photoactive compounds. The benzyl-substituted photoactive compounds of the invention are particularly suitable as the photoactive component in chemically amplified positive-acting and negative-acting compositions.
    Type: Grant
    Filed: April 21, 1993
    Date of Patent: September 6, 1994
    Assignee: Shipley Company Inc.
    Inventors: Roger F. Sinta, George Barclay, Martha M. Rajaratnam
  • Patent number: 5248734
    Abstract: Polyphenylene is prepared by exposing a poly(1,2-disubstituted-cyclohexa-3,5-diene) precursor to ultraviolet light in the presence of an acid catalyst. The acid catalyst is activated by the ultraviolet radiation and forms polyphenylene by aromatizing the cyclohexene rings of the poly(1,2-disubstituted-cyclohexa-3,5-diene).
    Type: Grant
    Filed: June 16, 1992
    Date of Patent: September 28, 1993
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Christopher K. Ober, George Barclay, Thomas Mates, Hwan-Kyu Kim