Abstract: The isomerization of an alkylated phenol composition that contains an ortho-alkyl substituted phenol component to isomerize and reduce the level of ortho-alkyl substituted phenol component therein can be accomplished by heating that composition in the presence of a catalytically effective amount of a solid acid catalyst to carry out such isomerization and reduction in the level of ortho-alkyl substituted phenol. Examples of suitable solid acid catalysts can be selected from the H-form zeolites, the supported sulfonic acids, and the heteropoly acids. The resulting isomerized product can be subsequently phosphorylated.

Abstract: The isomerization of an alkylated phenol composition that contains an ortho-alkyl substituted phenol component to isomerize and reduce the level of ortho-alkyl substituted phenol component therein can be accomplished by heating that composition in the presence of a catalytically effective amount of a solid acid catalyst to carry out such isomerization and reduction in the level of ortho-alkyl substituted phenol. Examples of suitable solid acid catalysts can be selected from the H-form zeolites, the supported sulfonic acids, and the heteropoly acids. The resulting isomerized product can be subsequently phosphorylated.

Abstract: The isomerization of an alkylated phenol composition that contains an ortho-alkyl substituted phenol component to isomerize and reduce the level of ortho-alkyl substituted phenol component therein can be accomplished by heating that composition in the presence of a catalytically effective amount of a solid acid catalyst to carry out such isomerization and reduction in the level of ortho-alkyl substituted phenol. Examples of suitable solid acid catalysts can be selected from the H-form zeolites, the supported sulfonic acids, and the heteropoly acids. The resulting isomerized product can be subsequently phosphorylated.

Abstract: The isomerization of an alkylated phenol composition that contains an ortho-alkyl substituted phenol component to isomerize and reduce the level of ortho-alkyl substituted phenol component therein can be accomplished by heating that composition in the presence of a catalytically effective amount of a solid acid catalyst to carry out such isomerization and reduction in the level of ortho-alkyl substituted phenol. Examples of suitable solid acid catalysts can be selected from the H-form zeolites, the supported sulfonic acids, and the heteropoly acids. The resulting isomerized product can be subsequently phosphorylated.

Abstract: A process for forming an alkoxide-derived yttrium-barium-copper oxide high temperature superconductor thin film by sol-gel processing is disclosed. It comprises first forming a thin film comprising solubilized yttrium and barium alkoxides and copper aminoalkoxide, under an inert gas atmosphere, on a non-reactive substrate, the amount of copper amino alkoxide being in excess of the stoichiometric amount to compensate for losses due to volatility of the copper amino alkoxide. The coating composition is then heated first in a moisture laden inert gas atmosphere, to hydrolyze the alkoxides, to temperatures in excess of the formation temperature of the superconductor. It is thereafter calcined in an oxygen atmosphere at higher temperatures to form the high temperature superconductor thin film.

Abstract: Copper oxide films can be formed on a substrate by coating the substrate with an organic solvent containing an aminoalkoxy copper(II) compound, and pyrolyzing the thus formed coating. The aminoalkoxy copper compound can be a bis(aminoalkoxy)copper(II) compound, a bis(alkylaminoalkoxy) copper(II) compound, or mixtures thereof.

Abstract: Oligomers and polymers, useful as interlayer dielectric films, are formed by the co(hydrolysis/condensation) of an aryl group-containing trifunctional silanetriol or derivative with a tetrafunctional silicic acid compound. The respective tri- and tetrafunctional substituents on either silicon compound reaction are chosen so that they act as reactants in condensation oligomerization or polymerization reactions with the substituents on the other reactant.

Abstract: The etching of cured arylsiloxane/silicate resin coatings with HF is improved if the curing of said coatings, prior to etching, comprises curing with energy ray irradiation.

Abstract: Striation-free interlayer dielectric films of good reflectivity are formed by spin-coating a solution comprising 1,2,4-trimethylbenzene solvent containing a dissolved arylsiloxane oligomer or polymer capable of forming an interlayer dielectric film.