Abstract: By proper selection of illumination configuration, mask transmission, and mask bias, complex patterns of contact holes may be imaged with sufficient latitude for manufacturing at minimum half-pitches of k1=0.40 or below. In an embodiment, a method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The method includes illuminating a mask pattern of an attenuated phase shift mask with an illumination configuration including on-axis and off-axis components, the off-axis component of the illumination being an annular illumination extending near a pupil edge, and projecting an image of the illuminated mask pattern onto the substrate.

Abstract: A method for account tracking that includes receiving a request to generate a report for a business entity, wherein the request specifies a tag associated with the business entity, identifying a plurality of transaction records based on the tag to obtain a plurality of identified transaction records for the business entity, assigning a business category from a plurality of business categories to at least one of the plurality of identified transaction records not associated with one of the plurality of business categories, and generating the report for the business entity by grouping the plurality of identified transaction records according to the plurality of business categories.

Abstract: A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; ranking the pixel groups according to how a change in state of a pixel group affects a lithographic metric; and for each pixel group in order of ranking, determining whether to adjust the illumination shape by changing the state of the pixel group based on a calculation of the lithographic metric as a result of a change in state of the pixel group.

Abstract: A financial data management application sets up a placeholder entry for entered current holdings information in which all the historical transactions that led to the current holdings have not been accounted for. Backfill transactions may be entered later on to update the placeholder entry with all or part of the historical transactions that led to the current holdings. If a backfill transaction is entered, the placeholder entry is adjusted to reflect the backfill transaction.

Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.

Abstract: A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.

Abstract: A system and method for making life cycle plans includes a planning engine, an input/output module, a user interface, and financial planning software. The planning engine maintains a plurality of items associated with one or more life cycle plans. Each item has one or more variables, which store data. Each item additionally maintains information about its status within each plan. For each plan, the individual item may be active, inactive, or not present in the plan. When a second or subsequent plan is created, only those items having new or changed variable values are recreated. Instead of each item being copied to the second plan, the item instead maintains state information indicating its state within each plan.

Abstract: A method for associating a tax-line item to a user transaction in a financial management software application including obtaining the user transaction by the financial management software application, associating a first tax line item with the user transaction, where the tax line item is selected by accepting input from a user separately from categorizing the transaction, and presenting the user transaction and the first tax line item selected by the user.

Abstract: A system that automatically classifies a financial transaction as a recurring financial transaction based on classification data obtained from a set of users is presented. The system can also determine the frequency at which the recurring financial transaction repeats. If the financial transaction is classified as a recurring financial transaction, the system can mark the financial transaction as a recurring financial transaction. Alternatively, the system can notify the user that the classification data indicates that the financial transaction can be classified as a recurring financial transaction.

Abstract: A system that determines a standard payee name for a payee is presented. During operation, the system receives a non-standard payee name, wherein the non-standard payee name can be a user-defined payee name, which is defined by a user, or a normalized payee name, which is defined by a financial institution. Next, the system determines whether the non-standard payee name is associated with the standard payee name by using the non-standard payee name to search through data structures containing associations between one or more of the following: user-defined payee names and normalized payee names; user-defined payee names and standard payee names; and normalized payee names and standard payee names. If the non-standard payee name is associated with a standard payee name, the system can perform specified actions.

Abstract: A method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The lithographic apparatus includes an illumination system configured to provide an illumination configuration and a projection system. In an embodiment of the invention, the method includes illuminating a mask pattern with an illumination configuration that includes a dark field component; and projecting an image of the illuminated pattern onto the substrate at a plurality of positions spaced apart from a reference plane that substantially coincides with or is substantially parallel to a surface of the substrate.

Abstract: A method and system for providing coupons to select consumers includes a process for providing coupons to select consumers whereby a coupon provider defines one or more coupon eligibility criterion that must be met by a consumer in order for the consumer to be eligible to receive one or more coupons. Access to data representing the one or more coupon eligibility criterion is then provided. A consumer's financial data is then obtained from one or more sources using a computing system implemented financial management system. In one embodiment, using the consumer's financial data and the data representing the one or more coupon eligibility criterion, one or more coupons are identified that the consumer is eligible to receive. In one embodiment, the consumer is then provided access to the one or more coupons identified that the consumer is eligible to receive.

Abstract: A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus is presented. The method includes adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and illuminating the patterning device pattern with the first and second illumination shapes.

Abstract: A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.

Abstract: By proper selection of illumination configuration, mask transmission, and mask bias, complex patterns of contact holes may be imaged with sufficient latitude for manufacturing at minimum half-pitches of k1=0.40 or below. In an embodiment, a method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The method includes illuminating a mask pattern of an attenuated phase shift mask with an illumination configuration including on-axis and off-axis components, the off-axis component of the illumination being an annular illumination extending near a pupil edge, and projecting an image of the illuminated mask pattern onto the substrate.

Abstract: A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.

Abstract: By proper selection of illumination configuration, mask transmission, and mask bias, complex patterns of contact holes may be imaged with sufficient latitude for manufacturing at minimum half-pitches of k1=0.40 or below. In an embodiment, a method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The method includes illuminating a mask pattern of an attenuated phase shift mask with an illumination configuration including on-axis and off-axis components, the off-axis component of the illumination being an annular illumination extending near a pupil edge, and projecting an image of the illuminated mask pattern onto the substrate.

Abstract: The present invention provides compositions comprising fulvic acid. The present invention further provides methods and compositions for promoting hair growth involving the use of fulvic acid.

Abstract: A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.

Abstract: A method of configuring a transfer of an image of a patterning device pattern onto a substrate with a lithographic apparatus. The method includes determining an intermediate illumination arrangement parameter and an intermediate patterning device parameter by varying an initial illumination arrangement parameter and an initial patterning device parameter using a calibrated model until the calculated image of the pattern printed on the substrate is within predetermined specification; calculating a metric that represents a lithographic response of the printed pattern over a process range, where the pattern would be imaged with the intermediate illumination arrangement and patterning device parameters over the process range, and depending on a result of the metric, adjusting the initial patterning device and illumination arrangement parameters.