Patents by Inventor George Hilary Harrold
George Hilary Harrold has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230314931Abstract: Systems, apparatuses, and methods are provided for transporting a reticle chamber (pod) for processing. In one example, a system for transporting the pod is disclosed. The system may include a moving apparatus, abase coupled to the moving apparatus, and a gripping ring extending from the base. In some aspects, the gripping ring grips a flange extending from the pod. The moving apparatus moves the base in response to the gripping ring gripping the flange.Type: ApplicationFiled: August 19, 2021Publication date: October 5, 2023Applicant: ASML Holding N.V.Inventors: Boris KOGAN, Robert Jeffrey WADE, George Hilary HARROLD, Matthew BOUDREAU
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Patent number: 9983487Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.Type: GrantFiled: November 20, 2015Date of Patent: May 29, 2018Assignees: ASML Holding N.V, ASML Netherlands B.V.Inventors: Robert Gabriël Maria Lansbergen, George Hilary Harrold, Richard John Johnson, Hugo Jacobus Gerardus Van Der Weijden
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Patent number: 9457947Abstract: An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device.Type: GrantFiled: October 12, 2012Date of Patent: October 4, 2016Assignee: ASML HOLDING N.V.Inventors: Robert Gabriël Maria Lansbergen, Peter C. Kochersperger, David Ramirez, Xugang Xiong, George Hilary Harrold, Arindam Sinharoy
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Publication number: 20160077443Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.Type: ApplicationFiled: November 20, 2015Publication date: March 17, 2016Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Robert Gabriël Maria LANSBERGEN, George Hilary HARROLD, Richard John JOHNSON, Hugo Jacobus Gerardus VAN DER WEIJDEN
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Patent number: 9268241Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.Type: GrantFiled: April 14, 2009Date of Patent: February 23, 2016Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Robert Gabriël Maria Lansbergen, George Hilary Harrold, Richard John Johnson, Hugo Jacobus Gerardus Van Der Weijden
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Patent number: 8614786Abstract: A robot positions a workpiece within a vacuum chamber of a lithographic apparatus. A first component of the robot is located within a vacuum chamber to position a workpiece along a translational axis. A shaft supports the first component such that an axis of symmetry of the shaft is perpendicular to the translational axis, and a second component rotates the shaft about the axis of symmetry and moves the shaft in a direction parallel to the axis of symmetry. The second component includes a gas bearing configured to introduce gas along a circumferential surface of the shaft and a scavenging seal configured to evacuate the gas introduced by the second component gas bearing. The robot substantially reduces, or eliminates the out-gassing of hydrocarbon molecules in a range from about 0 to 200 a.m.u., thus rendering the robot suitable for use in extreme ultra-violet (EUV) photolithography applications.Type: GrantFiled: April 22, 2009Date of Patent: December 24, 2013Assignee: ASML Netherlands B.V.Inventors: Robert Gabriël Maria Lansbergen, George Hilary Harrold, Matthew James Van Doren
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Publication number: 20110032505Abstract: A robot positions a workpiece within a vacuum chamber of a lithographic apparatus. A first component of the robot is located within a vacuum chamber to position a workpiece along a translational axis. A shaft supports the first component such that an axis of symmetry of the shaft is perpendicular to the translational axis, and a second component rotates the shaft about the axis of symmetry and moves the shaft in a direction parallel to the axis of symmetry. The second component includes a gas bearing configured to introduce gas along a circumferential surface of the shaft and a scavenging seal configured to evacuate the gas introduced by the second component gas bearing. The robot substantially reduces, or eliminates the out-gassing of hydrocarbon molecules in a range from about 0 to 200 a.m.u., thus rendering the robot suitable for use in extreme ultra-violet (EUV) photolithography applications.Type: ApplicationFiled: April 22, 2009Publication date: February 10, 2011Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Robert Gabriël Maria Lansbergen, George Hilary Harrold, Matthew James Van Doren
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Publication number: 20110020104Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.Type: ApplicationFiled: April 14, 2009Publication date: January 27, 2011Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Robert Gabriel Maria Lansbergen, George Hilary Harrold, Richard John Johnson, Hugo Jacobus Gerardus Van Der Weijden
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Publication number: 20090259337Abstract: A Robot Position Calibration Tool (RPCT) is used to accurately calibrate a robot position for a reticle hand-off to a transfer station in a lithography tool with minimized particle generation and outgassing. Method(s), system(s) and computer program product(s) are described to calibrate the robot with minimal sensor usage and minimal slippage of a payload leading to minimized particle generation and outgassing inside a vacuum chamber of a lithography tool.Type: ApplicationFiled: March 18, 2009Publication date: October 15, 2009Applicant: ASML Holding N.V.Inventors: George Hilary Harrold, Richard John Johnson