Abstract: Rails 20 corresponding to lines A, B, C are provided in parallel on a bass plate 1, and coupling members 21, 22 are slidably mounted on each of the rails 20. Each of fluid controllers 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14 is mounted generally on two of these coupling members 21, 22.

Abstract: Each of lines A, B is provided on each of opposite sides thereof with a tape heater 11, and a space for positioning a tape heater holding clip 13 therein is provided in each of locations between adjacent fluid control devices. The tape heaters 11 are held from opposite sides thereof to the line by the clip 13. The lines A, B provided with the heaters are each mounted on a line support member 10 removably attached to a base member 1. The line support member 10 has a heater insertion bore 14 formed therein and extending longitudinally thereof. A sheath heater 12 is inserted into the bore 14.

Abstract: A carbon wire heating element sealing heater is provided. Therein, a carbon wire heating element using carbon fibers is sealed in a quartz glass member, wherein absorption water quantity of the carbon wire heating element is 2×10?3 g/cm3 or less.

Abstract: Each of lines A, B is provided on each of opposite sides thereof with a tape heater 11, and a space for positioning a tape heater holding clip 13 therein is provided in each of locations between adjacent fluid control devices. The tape heaters 11 are held from opposite sides thereof to the line by the clip 13. The lines A, B provided with the heaters are each mounted on a line support member 10 removably attached to a base member 1. The line support member 10 has a heater insertion bore 14 formed therein and extending longitudinally thereof. A sheath heater 12 is inserted into the bore 14.

Abstract: A carbon wire heating element sealing heater is provided. Therein, a carbon wire heating element using carbon fibers is sealed in a quartz glass member, wherein absorption water quantity of the carbon wire heating element is 2×10?3 g/cm3 or less.

Abstract: A carbon wire heating element sealing heater is provided. Therein, a carbon wire heating element using carbon fibers is sealed in a quartz glass member, wherein absorption water quantity of the carbon wire heating element is 2×10?3 g/cm3 or less.

Abstract: The present invention relates generally to a heat treatment system and method for heat-treating an object to be treated. Particularly, the invention relates to a heat treatment system wherein an object to be treated is carried in a reaction vessel, which has been pressure-reduced to a predetermined degree of vacuum and the interior of which is heated to a predetermined process temperature, and a process gas is supplied into the reaction vessel via a gas feed passage to process the object.

Abstract: A carbon wire heating element sealing heater is provided. Therein, a carbon wire heating element using carbon fibers is sealed in a quartz glass member, wherein absorption water quantity of the carbon wire heating element is 2×10−3 g/cm3 or less.

Abstract: When an oxidation process for semiconductor wafers is carried out by a batch type furnace, the uniformity of the thickness of a film is intended to be improved so as to be capable of carrying out a low temperature process. In a system for feeding a mixed gas of hydrogen gas and water vapor into a reaction vessel to carry out a so-called wet oxidation, a ventilation resistance material is provided in an outside passage of a double-pipe passage for heating gas in an external combustion system, and a mixed gas of hydrogen gas and hydrogen chloride gas is passed through the ventilation resistance material to be heated to a process temperature or higher by means of the heater of the combustion system to previously produce a very small amount of water vapor to carry out a dry oxidation. When dinitrogen oxide gas is used for producing a nitrogen containing silicon oxide film, dinitrogen oxide gas is passed through the outside passage to be previously activated.

Abstract: The present invention relates generally to a heat treatment system and method for heat-treating an object to be treated. Particularly, the invention relates to a heat treatment system wherein an object to be treated is carried in a reaction vessel, which has been pressure-reduced to a predetermined degree of vacuum and the interior of which is heated to a predetermined process temperature, and a process gas is supplied into the reaction vessel via a gas feed passage to process the object.

Abstract: Rails 20 corresponding to lines A, B, C are provided in parallel on a bass plate 1, end Coupling members 21, 22 are slidably mounted on each of the rails 20. Each of fluid controllers 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14 is mounted generally on two of these coupling members 21, 22.

Abstract: When an oxidation process for semiconductor wafers is carried out by a batch type furnace, the uniformity of the thickness of a film is intended to be improved so as to be capable of carrying out a low temperature process. In a system for feeding a mixed gas of hydrogen gas and water vapor into a reaction vessel to carry out a so-called wet oxidation, a ventilation resistance material is provided in an outside passage of a double-pipe passage for heating gas in an external combustion system, and a mixed gas of hydrogen gas and hydrogen chloride gas is passed through the ventilation resistance material to be heated to a process temperature or higher by means of the heater of the combustion system to previously produce a very small amount of water vapor to carry out a dry oxidation. When dinitrogen oxide gas is used for producing a nitrogen containing silicon oxide film, dinitrogen oxide gas is passed through the outside passage to be previously activated.