Patents by Inventor George K C Huang

George K C Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for forming patterned photoresist layer
    Patent number: 7033903
    Abstract: A method for forming a patterned photoresist layer aligned with a predetermined layer is described. A photoresist layer is formed on a substrate and then exposed. The overlay offset between the exposed portions of the photoresist layer and the predetermined layer is measured for determining whether the exposed portions of the photoresist layer are aligned with the predetermined layer. A development step is performed when the exposed portions of the photoresist layer are found to align with the predetermined layer. An apparatus for forming a patterned photoresist layer is also described, which utilizes the aforementioned method and has a mechanism capable of feeding back the overlay offset in real time for reducing the cycle time and the rework time in the lithography process.
    Type: Grant
    Filed: February 18, 2004
    Date of Patent: April 25, 2006
    Assignee: United Microelectronics Corp.
    Inventors: Jack Lin, Calvin Wu, George K C Huang