Abstract: A memory in which each cell comprises an MOS transistor merged with a storage capacitor and in which the cells are arranged to permit adjacent pairs of transistors in a common column to share a common source and the transistors in a common row to share a common gate electrode conductor. The memory uses a first polycrystalline silicon layer which is patterned to provide interconnected storage electrodes and a second polycrystalline silicon layer which is patterned to provide a plurality of stripes to serve as the bit sense lines and a plurality of gate electrodes.