Patents by Inventor George Martin Benedikt

George Martin Benedikt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Modified polycyclic polymers
    Patent number: 6794459
    Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
    Type: Grant
    Filed: August 21, 2002
    Date of Patent: September 21, 2004
    Assignees: Sumitomo Bakelite Co., Ltd., International Business Machines Corp.
    Inventors: Saikumar Jayaraman, George Martin Benedikt, Larry Funderburk Rhodes, Richard Vicari, Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Thomas Wallow
  • Modified polycyclic polymers
    Publication number: 20030018153
    Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety.
    Type: Application
    Filed: August 21, 2002
    Publication date: January 23, 2003
    Applicant: The B.F.Goodrich Company
    Inventors: Saikumar Jayaraman, George Martin Benedikt, Larry Funderburk Rhodes, Richard Vicari, Robert David Allen, Richard Anthony DiPetro, Ratnam Sooriyakumaran, Thomas Wallow
  • Modified polycyclic polymers
    Patent number: 6451945
    Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: September 17, 2002
    Assignees: The B.F. Goodrich Company, International Business Machines Corp.
    Inventors: Saikumar Jayaraman, George Martin Benedikt, Larry Funderburk Rhodes, Richard Vicari, Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Thomas Wallow
  • Addition polymers derived from norbornene-functional monomers and process therefor
    Patent number: 5741869
    Abstract: Addition polymers derived from norbornene-functional monomers are terminated with an olefinic moiety derived from a chain transfer agent selected from a compound having a terminal olefinic double bond between adjacent carbon atoms, excluding styrenes, vinyl ethers, and conjugated dienes and at least one of said carbon atoms has two hydrogen atoms attached thereto. The addition polymers of this invention are prepared from a single or multicomponent catalyst system including a Group VIII metal ion source. The catalyst systems are unique in that they catalyze the insertion of the chain transfer agent exclusively at a terminal end of the polymer chain.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: April 21, 1998
    Assignee: The B.F. Goodrich Company
    Inventors: Brian Leslie Goodall, George Martin Benedikt, Lester Howard McIntosh, III, Dennis Allen Barnes, Larry Funderburk Rhodes