Patents by Inventor George Wakalopulos

George Wakalopulos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5637953
    Abstract: An electron beam device has a cathode that generates a fan-shaped electron beam. A first focusing lens includes first and second plates on opposed sides of a filament. The edges of the plates closest to a positively charged anode are arcuate, so that as individual electrons are accelerated normal to the edge of the charged plates, the beam increases in length with departure from the filament. A second focusing lens includes third and fourth plates on opposed sides of the first focusing lens. Each of the third and fourth plates has an arcuate edge proximate to the positively charged anode. The plates of the first and second focusing lenses provide focusing in a widthwise direction, while defining the increase in the lengthwise direction. Preferably, the filament is also curved. In the preferred embodiment, the curvature of the plates of the first focusing lens defines a common radius with the plates of the second focusing lens.
    Type: Grant
    Filed: January 22, 1996
    Date of Patent: June 10, 1997
    Assignee: American International Technologies, Inc.
    Inventor: George Wakalopulos
  • Patent number: 5612588
    Abstract: A vacuum tube electron beam device having a thin, single crystal, electron permeable, gas impermeable membrane for electron transmission and methods for making such a device. Single crystal membranes can have small thickness due to high strength, are highly transmissive to free electrons due to that small thickness. The ordered crystalline structure of such membranes provides minimal obstructions to electron beams, and yet is highly impermeable to penetration by gas and liquid molecules. Single crystals are anisotropically etched to precise membrane dimensions, and can also be etched to provide microchannel structures for flowing cooling fluid across the membrane during use. A doped silicon anode can provide support for the membrane with matching thermal expansion characteristics, and a crystalline anode can be integral with the membrane. A double membrane embodiment confines the cooling fluid so that it passes close to both membranes.
    Type: Grant
    Filed: January 5, 1995
    Date of Patent: March 18, 1997
    Assignee: American International Technologies, Inc.
    Inventor: George Wakalopulos
  • Patent number: 5557163
    Abstract: An electron beam device having a plurality of individual, electron permeable, gas impermeable windows can produce a broad beam of free electrons. A multiplicity of windows allows each of the windows to be stronger, yet thinner, for greater electron permeability and durability. Having multiple windows also allows each window to be formed as a single crystal film, which can have superior strength and electron permeability, and which is difficult to form in a large area and easy to damage when so formed. In addition, having multiple windows allows a window end of the device and the beam which exits from that end to have configurations not easily achieved with a single window. Should a pinhole develop in one of the windows, it may be possible to seal the pinhole and re-evacuate the device, thereby extending the lifetime of the device. A current monitor is used to determine whether the electron beam passes through the windows or is absorbed in a surrounding face plate.
    Type: Grant
    Filed: July 22, 1994
    Date of Patent: September 17, 1996
    Assignee: American International Technologies, Inc.
    Inventor: George Wakalopulos
  • Patent number: 5414267
    Abstract: An array of electron beam tubes is mounted on a conductive plate for projecting stripe-like electron beams through air onto a substrate beneath the plate. The tubes each have a narrow beam window formed by a very thin low-Z film layer, supported by silicon and sealing the tube against ambient pressure. Such windows produce low beam attenuation and allow low extraction voltages to be used, thereby reducing beam energy which would otherwise be lost by penetration through a surface to be treated. The stripe-like output electron beam segments may be formed into a linear beam track so that the entire widthwise extent of a surface, such as a sheet or web, may be treated by electron beam irradiation or the beam segments may be formed into any desired composite beam pattern. In another embodiment the stripe-like output beam segments may be arranged in an array to treat a circular circumferential surface, such as a cable.
    Type: Grant
    Filed: May 26, 1993
    Date of Patent: May 9, 1995
    Assignee: American International Technologies, Inc.
    Inventor: George Wakalopulos
  • Patent number: 5215636
    Abstract: A pulsed surface discharge apparatus for treating dielectric surfaces, such as polymers, having a pair of electrodes spaced apart adjacent to a surface to be treated, means for supplying an inert gas, or a predominantly inert gas mixture, adjacent to the surface in the region between the electrodes, an electric pulse generator providing repeated pulses of a high voltage to the electrodes sufficient to cause breakdown of the inert gas and generate a discharge across the surface to be treated, and a dielectric surface transport for moving the surface to be treated past the electrodes. The electrodes and inert gas may be enclosed within a treatment chamber having entrance and exit ports for the material to be treated, and adapted for wire, rod, tube, sheet or other forms of dielectric material. One embodiment encloses the supply of dielectric material, which material drags inert gas along with to the discharge region.
    Type: Grant
    Filed: September 27, 1991
    Date of Patent: June 1, 1993
    Assignee: American International Technologies, Inc.
    Inventors: Vladimir A. Danilychev, George Wakalopulos
  • Patent number: 4910435
    Abstract: A wide area electron gun in which an electron beam originates from secondary emission electrons emitted by a target bombarded by ions. A cylindrical main housing has a central region where the secondary emission target is located and auxiliary housings on opposed sides of the target, outside of the main housing, contain low temperature ion plasmas. Ion beams are extracted from peripheral regions of the plasmas and enter narrow ports or slits connecting the auxiliary housings with the main housing. A higher pressure in the auxiliary housings, compared to the main housing, supports ion flow into the main housing. The ion beams have a low angle of incidence to the plane of the target and may be either slightly below or above the target. In the case the beam enters from above the target, the target is segmented, like venetian blinds. The secondary electrons exit the main housing through a foil window such that the electron beam is almost at right angles to the ion beams.
    Type: Grant
    Filed: July 20, 1988
    Date of Patent: March 20, 1990
    Assignee: American International Technologies, Inc.
    Inventor: George Wakalopulos
  • Patent number: 4755722
    Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode.
    Type: Grant
    Filed: March 5, 1987
    Date of Patent: July 5, 1988
    Assignee: RPC Industries
    Inventor: George Wakalopulos
  • Patent number: 4749911
    Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passage through an extraction grid and plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode.
    Type: Grant
    Filed: March 30, 1987
    Date of Patent: June 7, 1988
    Assignee: RPC Industries
    Inventors: George Wakalopulos, Sherman R. Farrell
  • Patent number: 4694222
    Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode.
    Type: Grant
    Filed: April 2, 1984
    Date of Patent: September 15, 1987
    Assignee: RPC Industries
    Inventor: George Wakalopulos
  • Patent number: 4558450
    Abstract: A high power, electrically excited laser is disclosed wherein a laser gas is caused to flow through an excitation region in which an electric discharge is established along a direction transverse to the direction of flow of the laser gas between an anode and a porous cathode disposed on opposite sides of the excitation region, and wherein an electron beam is introduced into the excitation region along a direction parallel to the direction of the discharge. A first quantity of an auxiliary gas (preferably helium) having a normal glow current density at least an order of magnitude less than that of the laser gas is introduced into the upstream end of the excitation region adjacent to the cathode and caused to flow across the cathode surface along a direction parallel to that of the laser gas. A second quantity of the auxiliary gas is "bled" through the porous cathode and gradually added to the auxiliary gas stream flowing across the cathode surface.
    Type: Grant
    Filed: March 29, 1982
    Date of Patent: December 10, 1985
    Inventors: George Wakalopulos, Robert A. Hill, Eugene R. Peressini
  • Patent number: 4025818
    Abstract: A high voltage glow discharge power source providing a plurality of glow discharges by gas ignition within an first elongated member, which member has a central bore along the axis of elongation of the member. A second member used in an E-gun application having a cavity with a soft vacuum in the cavity, and a third similar member parallel to the second member and a common interface boundary between the second and third members. Electrodes are positioned along the outer surface along the length of the first member to which current sources and sinks are connected in alternation. The second member has a common wire running its length with auxiliary wires connected to the common wire which are connected in turn to the sources and sinks. A DC power supply provides the energy for the current sources and sinks used with the first member. End plates covering the bore of the first member are transparent to optical frequencies.
    Type: Grant
    Filed: April 20, 1976
    Date of Patent: May 24, 1977
    Assignee: Hughes Aircraft Company
    Inventors: Robert P. Giguere, Robert D. Washburn, George Wakalopulos
  • Patent number: 3970892
    Abstract: In the disclosed electron gun positive ions generated by a hollow cathode plasma discharge in a first chamber are accelerated through control and shield grids into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam having a distribution adjacent to the cathode emissive surface substantially the same as the distribution of the ion beam impinging upon the cathode. After passing through the grids and the plasma discharge chamber, the electron beam exits from the electron gun via a foil window. Control of the generated electron beam is achieved by applying a relatively low control voltage between the control grid and the electron gun housing (which resides at ground potential) to control the density of the positive ions bombarding the cathode.
    Type: Grant
    Filed: May 19, 1975
    Date of Patent: July 20, 1976
    Assignee: Hughes Aircraft Company
    Inventor: George Wakalopulos
  • Patent number: RE35203
    Abstract: An array of electron beam tubes is mounted on a conductive plate for projecting strip-like electron beams through air onto a substrate beneath the plate. The tubes each have a narrow beam window formed by a very thin low-Z film layer, supported by silicon and sealing the tube against ambient pressure. Such windows produce low beam attenuation and allow low extraction voltages to be used, thereby reducing beam energy which would otherwise be lost by penetration through a surface to be treated. The stripe-like output electron beam segments may be formed into a linear beam track so that the entire widthwise extent of a surface, such as a sheet or web, may be treated by electron beam irradiation or the beam segments may be formed into any desired composite beam pattern. In another embodiment the stripe-like output beam segments may be arranged in an array to treat a circular circumferential surface, such as a cable.
    Type: Grant
    Filed: July 3, 1995
    Date of Patent: April 9, 1996
    Assignee: American International Technologies, Inc.
    Inventor: George Wakalopulos