Patents by Inventor George Wasilczyk

George Wasilczyk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymeric lapping materials, media and systems including polymeric lapping material, and methods of forming and using same
    Patent number: 10092991
    Abstract: A polymeric material suitable for use in lapping processes, media including the polymeric material, systems including the media, and methods of forming and using the polymeric material are disclosed. The polymeric material can be used to lap hard surfaces, such as sapphire surfaces. The lapping process can be performed after a grinding process and before a polishing process.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: October 9, 2018
    Assignee: JH Rhodes Company, Inc.
    Inventors: George Wasilczyk, Brent Muncy, Scott Daskiewich
  • Polishing material for polishing hard surfaces, media including the material, and methods of forming and using same
    Patent number: 9649741
    Abstract: Polishing materials suitable for polishing hard surfaces, media including the polishing material, and methods of forming and using the polishing materials and media are disclosed. Exemplary polishing materials have a relatively high hard segments:soft segments ratio and exhibit relatively high removal rates and/or relatively high process yields.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: May 16, 2017
    Assignee: JH RHODES COMPANY, INC.
    Inventors: Scott Daskiewich, Brent Muncy, George Wasilczyk
  • POLYMERIC LAPPING MATERIALS, MEDIA AND SYSTEMS INCLUDING POLYMERIC LAPPING MATERIAL, AND METHODS OF FORMING AND USING SAME
    Publication number: 20170028526
    Abstract: A polymeric material suitable for use in lapping processes, media including the polymeric material, systems including the media, and methods of forming and using the polymeric material are disclosed. The polymeric material can be used to lap hard surfaces, such as sapphire surfaces. The lapping process can be performed after a grinding process and before a polishing process.
    Type: Application
    Filed: July 28, 2016
    Publication date: February 2, 2017
    Applicant: JH Rhodes Company, Inc.
    Inventors: George Wasilczyk, Brent Muncy, Scott Daskiewich
  • POLISHING MATERIAL FOR POLISHING HARD SURFACES, MEDIA INCLUDING THE MATERIAL, AND METHODS OF FORMING AND USING SAME
    Publication number: 20160001417
    Abstract: Polishing materials suitable for polishing hard surfaces, media including the polishing material, and methods of forming and using the polishing materials and media are disclosed. Exemplary polishing materials have a relatively high hard segments:soft segments ratio and exhibit relatively high removal rates and/or relatively high process yields.
    Type: Application
    Filed: July 7, 2014
    Publication date: January 7, 2016
    Inventors: Scott Daskiewich, Brent Muncy, George Wasilczyk