Abstract: In one embodiment a method of making an electrostatic actuator includes: forming a first conductor over a first substrate to form a first structure; forming a flexible second conductor over a second substrate to form a second structure; forming an etch stop over the first conductor as part of the first structure or over the second conductor as part of the second structure; forming a spacer on the etch stop, the spacer selectively etchable with respect to the etch stop; etching the spacer through to the etch stop at a location of a gap between the first conductor and the second conductor; and bonding the first structure and the second structure together such that the first conductor is located opposite the second conductor across the gap.

Abstract: An apparatus includes micro-electromechanical (MEM) devices, a charge source, and a discharge mechanism. Each MEM device has different states based on a charged induced thereon. The charge source is to induce the charge thereon such that the MEM devices each enter one of the different states thereof. The discharge mechanism for the MEM devices is to discharge the induced thereon. The discharge mechanism includes one of a resistor for each MEM device and an ultraviolet (UV) light source. The resistor is to discharge the charge on its MEM device to ground. The UV light source is to emit photons onto the MEM devices, such that the photons discharge the charge on the MEM devices via photoelectric effect.

Abstract: A light source comprises a plurality of light emitting diodes arranged around the perimeter of a reflective optical element, wherein each of the light emitting diodes selectively generates a light beam directed to the reflective optical element. The reflective optical element generates a light path by collimating and reflecting the selectively generated light beams from each of the light emitting diodes.

Abstract: In one embodiment a method of making an electrostatic actuator includes: forming a first conductor over a first substrate to form a first structure; forming a flexible second conductor over a second substrate to form a second structure; forming an etch stop over the first conductor as part of the first structure or over the second conductor as part of the second structure; forming a spacer on the etch stop, the spacer selectively etchable with respect to the etch stop; etching the spacer through to the etch stop at a location of a gap between the first conductor and the second conductor; and bonding the first structure and the second structure together such that the first conductor is located opposite the second conductor across the gap.

Abstract: The described embodiments relate to fluid-ejection devices and methods of forming same. One exemplary embodiment includes a plurality of fluid drop generators and associated electrically conductive paths, and at least one electron beam generation assembly configured to selectively direct at least one electron beam at individual electrically conductive paths sufficiently to cause fluid to be ejected from an associated fluid drop generator.

Abstract: An apparatus includes micro-electromechanical (MEM) devices, a charge source, and a discharge mechanism. Each MEM device has different states based on a charged induced thereon. The charge source is to induce the charge thereon such that the MEM devices each enter one of the different states thereof. The discharge mechanism for the MEM devices is to discharge the induced thereon. The discharge mechanism includes one of a resistor for each MEM device and an ultraviolet (UV) light source. The resistor is to discharge the charge on its MEM device to ground. The UV light source is to emit photons onto the MEM devices, such that the photons discharge the charge on the MEM devices via photoelectric effect.