Patents by Inventor Georgiy O. Vaschenko
Georgiy O. Vaschenko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140042343Abstract: Methods and apparatus for producing EUV from plasma are disclosed. The apparatus includes a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region. The plasma produces EUV radiation, wherein the droplet source comprises a nozzle having an orifice configured for ejecting a fluid and a sub-system having an electro-actuable element producing a disturbance in the fluid to cause at least some of the droplets to coalesce prior to being irradiated. The electro-actuable element is coupled to nozzle using an adhesive that has a high modulus at the nozzle operating temperature. Improvements also include tuning the nozzle assembly to more closely match the modulation waveform frequency with one of the resonance frequencies of the nozzle assembly by optimizing one of a mass, a shape, or material composition of at least one component in the nozzle assembly.Type: ApplicationFiled: August 22, 2013Publication date: February 13, 2014Applicant: CYMER, LLCInventor: Georgiy O. Vaschenko
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Publication number: 20130234051Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.Type: ApplicationFiled: April 30, 2013Publication date: September 12, 2013Inventors: Chirag Rajyaguru, Peter M. Baumgart, Georgiy O. Vaschenko
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Patent number: 8530871Abstract: Methods and apparatus for producing EUV from plasma are disclosed. The apparatus includes a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region. The plasma produces EUV radiation, wherein the droplet source comprises a nozzle having an orifice configured for ejecting a fluid and a sub-system having an electro-actuable element producing a disturbance in the fluid to cause at least some of the droplets to coalesce prior to being irradiated. The electro-actuable element is coupled to nozzle using an adhesive that has a high modulus at the nozzle operating temperature. Improvements also include tuning the nozzle assembly to more closely match the modulation waveform frequency with one of the resonance frequencies of the nozzle assembly by optimizing one of a mass, a shape, or material composition of at least one component in the nozzle assembly.Type: GrantFiled: April 12, 2012Date of Patent: September 10, 2013Assignee: Cymer, LLCInventor: Georgiy O. Vaschenko
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Patent number: 8513629Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.Type: GrantFiled: May 13, 2011Date of Patent: August 20, 2013Assignee: Cymer, LLCInventors: Chirag Rajyaguru, Peter Baumgart, Georgiy O. Vaschenko
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Patent number: 8319201Abstract: A plasma generating system is disclosed having a source of target material droplets, e.g. tin droplets, and a laser, e.g. a pulsed CO2 laser, producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation. For the device, the droplet source may comprise a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing at least some adjacent droplet pairs to coalesce together prior to reaching the irradiation region. In one implementation, the disturbance may comprise a frequency modulated disturbance waveform and in another implementation, the disturbance may comprise an amplitude modulated disturbance waveform.Type: GrantFiled: February 17, 2011Date of Patent: November 27, 2012Assignee: Cymer, Inc.Inventor: Georgiy O. Vaschenko
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Publication number: 20120292527Abstract: A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.Type: ApplicationFiled: May 20, 2011Publication date: November 22, 2012Applicant: CYMER, INC.Inventors: Igor V. Fomenkov, William N. Partlo, Georgiy O. Vaschenko, William Oldham
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Publication number: 20120286176Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.Type: ApplicationFiled: May 13, 2011Publication date: November 15, 2012Inventors: Chirag Rajyaguru, Peter Baumgart, Georgiy O. Vaschenko
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Publication number: 20120228526Abstract: Methods and apparatus for producing EUV from plasma are disclosed. The apparatus includes a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region. The plasma produces EUV radiation, wherein the droplet source comprises a nozzle having an orifice configured for ejecting a fluid and a sub-system having an electro-actuable element producing a disturbance in the fluid to cause at least some of the droplets to coalesce prior to being irradiated. The electro-actuable element is coupled to nozzle using an adhesive that has a high modulus at the nozzle operating temperature. Improvements also include tuning the nozzle assembly to more closely match the modulation waveform frequency with one of the resonance frequencies of the nozzle assembly by optimizing one of a mass, a shape, or material composition of at least one component in the nozzle assembly.Type: ApplicationFiled: April 12, 2012Publication date: September 13, 2012Inventor: Georgiy O. Vaschenko
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Patent number: 8158960Abstract: A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region.Type: GrantFiled: March 10, 2010Date of Patent: April 17, 2012Assignee: Cymer, Inc.Inventors: Georgiy O. Vaschenko, Alexander I. Ershov, Richard L. Sandstrom
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Patent number: 8138487Abstract: A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a first open end substantially aligned to the target material path and at least one internal surface oriented toward a second end of the first catch, the second end being opposite from the first open end.Type: GrantFiled: March 9, 2010Date of Patent: March 20, 2012Assignee: Cymer, Inc.Inventors: Georgiy O. Vaschenko, William N. Partlo, Igor V. Fomenkov, Richard L. Sandstrom, Alexander I. Ershov, David Brandt, Joshua J. Miller
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Patent number: 7872245Abstract: Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.Type: GrantFiled: June 19, 2008Date of Patent: January 18, 2011Assignee: Cymer, Inc.Inventors: Georgiy O. Vaschenko, Alexander N. Bykanov, Norbert R. Bowering, David C. Brandt, Alexander I. Ershov, Rodney D. Simmons, Oleh V. Khodykin, Igor V. Fomenkov
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Publication number: 20100294953Abstract: A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region.Type: ApplicationFiled: March 10, 2010Publication date: November 25, 2010Applicant: Cymer, Inc.Inventors: Georgiy O. Vaschenko, Alexander I. Ershov, Richard L. Sandstrom
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Publication number: 20100258747Abstract: A device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a sensor measuring flow of a fluid in the fluid line and providing a signal indicative thereof, and a pressure relief valve responsive to a signal to reduce a leak of source material into the chamber in the event of a failure of the component.Type: ApplicationFiled: July 23, 2009Publication date: October 14, 2010Applicant: CYMER, INC.Inventors: Georgiy O. Vaschenko, Krishna Ramadurai
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Publication number: 20100258748Abstract: A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a first open end substantially aligned to the target material path and at least one internal surface oriented toward a second end of the first catch, the second end being opposite from the first open end.Type: ApplicationFiled: March 9, 2010Publication date: October 14, 2010Inventors: Georgiy O. Vaschenko, William N. Partlo, Igor V. Fomenkov, Richard L. Sandstrom, Alexander I. Ershov, David Brandt, Joshua J. Miller
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Publication number: 20090230326Abstract: Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.Type: ApplicationFiled: June 19, 2008Publication date: September 17, 2009Applicant: CYMER, INC.Inventors: Georgiy O. Vaschenko, Alexander N. Bykanov, Norbert R. Bowering, David C. Brandt, Alexander I. Ershov, Rodney D. Simmons, Oleh V. Khodykin, Igor V. Fomenkov