Abstract: An energy absorbing retractor having a frame, locking mechanisms to initially stop a spool from rotating in a belt protraction direction, the spool rotationally supported relative to the frame, a seat belt wound about the spool, and bias means to retract the seat belt, a two sided torsion bar for generating at least a first level of reaction torque on the spool permitting the spool to rotate in a controlled manner in a belt protracting direction including a torsion bar having a middle portion fixedly coupled to the spool to prevent relative rotation therebetween, a first torsion rod extending therefrom, the first torsion rod including a first end coupled to a first locking mechanism to prevent the first end from rotating upon such coupling, whereby upon locking of the first end, and the loading of the spool, the first torsion rod is twisted to generate a first level of control force.

Abstract: An energy absorbing seat belt retractor having a frame, a locking mechanism to initially stop a spool from rotating in a belt protraction direction, the spool rotationally supported relative to the frame, a seat belt wound about the spool, and bias means to retract the seat belt, a mechanism means for permitting the spool to rotate in the belt protraction direction subsequent to being locked including a wire pulling device which pulls a formed wire member through a tortuous path and in so doing generates a reaction force to control the manner in which the spool rotates.

Abstract: An occupant protection system for protecting a seated occupant comprising: seat (20) having a seat cushion (22) and a seat back (24), frame means (26, 30) to support the seat back, a headrest extending above the seat back, cushion material (32) for providing resiliency to the seat and a protective cover material (34) covering the cushion material; an air bag (50,50'), having a first portion extending generally along the length of the seat back and a second portion which when inflated extends above the seat back to be positioned generally in front of the headrest, whereby upon inflation of the first portion of the air bag a portion of the seat back is gently urged against the spine of the occupant and the second portion expands upwardly to provide a protective layer between the headrest and the occupant's head.

Abstract: A method of manufacturing a semiconductor device gate is provided that reduces gate length variability while maintaining self-alignment and eliminating etch damage and substrate contamination. A gate opening (18) is formed in an oxide layer (16) using a anisotropic etch. The anisotropic etch creates a reverse gate metal image that has low gate length variability. Dual metal gate (26) is then deposited. The excess gate metal is then removed and the top surface (31) of the gate (30) planarized using a chemical mechanical polish. The remaining oxide (16) is then removed, leaving a precise gate (30). The use of a nitride barrier (12) and of an etchstop layer (14) of aluminum nitride under the oxide layer (16) is also shown.

Abstract: A retrograde profile is formed in a photoresist layer (11, 20) by modifying the rate at which a photoresist developer solution dissolves a portion (12) of a photoresist layer (11, 20). The photoresist layer (11, 20) is exposed to a chemical such as hexamethyldisilizane or dimethylsulfoxane to allow a portion (12) of the photoresist (11, 20) to absorb the chemical. The photoresist (11, 20) is then heated in order to enhance a reaction between the photoresist (11, 20) and the chemical. The reaction modifies a portion (12) of the photoresist (11, 20) to reduce the rate at which the portion (12) of the photoresist (11, 20) is dissolved by a developer solution.