Patents by Inventor Gerald Arthur Finken

Gerald Arthur Finken has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate comprising a mark
    Patent number: 8722179
    Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one further region formed by a second material. The first and second materials have different material characteristics with respect to a chemical-mechanical polishing process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the chemical-mechanical polishing process. The second mark can be provided with a second step height by applying the chemical-mechanical polishing process. The second step height is substantially different from the first step height.
    Type: Grant
    Filed: December 12, 2006
    Date of Patent: May 13, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken
  • Substrate comprising a mark
    Patent number: 8609441
    Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one region formed by a second material. The first and second materials have different material characteristics with respect to a substrate treatment process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the substrate treatment process. The second mark can be provided with a second step height by applying the substrate treatment process. The second step height is substantially different from the first step height.
    Type: Grant
    Filed: December 12, 2007
    Date of Patent: December 17, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken
  • Substrate comprising a mark
    Publication number: 20080212057
    Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one region formed by a second material. The first and second materials have different material characteristics with respect to a substrate treatment process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the substrate treatment process. The second mark can be provided with a second step height by applying the substrate treatment process. The second step height is substantially different from the first step height.
    Type: Application
    Filed: December 12, 2007
    Publication date: September 4, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken
  • Substrate comprising a mark
    Publication number: 20080138623
    Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one further region formed by a second material. The first and second materials have different material characteristics with respect to a chemical-mechanical polishing process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the chemical-mechanical polishing process. The second mark can be provided with a second step height by applying the chemical-mechanical polishing process. The second step height is substantially different from the first step height.
    Type: Application
    Filed: December 12, 2006
    Publication date: June 12, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken