Patents by Inventor Gerald B. Wayton
Gerald B. Wayton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10261418Abstract: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.Type: GrantFiled: August 29, 2016Date of Patent: April 16, 2019Assignee: Rohm and Haas Electronic Materials LLCInventors: Anthony Zampini, Gerald B. Wayton
-
Publication number: 20160363862Abstract: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.Type: ApplicationFiled: August 29, 2016Publication date: December 15, 2016Inventors: Anthony Zampini, Gerald B. Wayton
-
Patent number: 9429844Abstract: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.Type: GrantFiled: February 28, 2007Date of Patent: August 30, 2016Assignee: Rohm and Haas Electronic Materials LLCInventors: Anthony Zampini, Gerald B. Wayton
-
Patent number: 9244352Abstract: Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.Type: GrantFiled: May 18, 2010Date of Patent: January 26, 2016Assignee: Rohm and Haas Electronic Materials, LLCInventors: Anthony Zampini, Gerald B. Wayton, Vipul Jain, Cong Liu, Suzanne Coley, Owendi Ongayi
-
Patent number: 8927681Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.Type: GrantFiled: August 31, 2009Date of Patent: January 6, 2015Assignee: Rohm and Haas Electronic Materials LLCInventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
-
Patent number: 8911927Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.Type: GrantFiled: August 24, 2010Date of Patent: December 16, 2014Assignee: Rohm and Haas Electronic Materials LLCInventors: Michael K. Gallagher, Gerald B. Wayton, Gregory P. Prokopowicz, Stewart A. Robertson
-
Publication number: 20120034562Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.Type: ApplicationFiled: August 31, 2009Publication date: February 9, 2012Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
-
Publication number: 20110123937Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.Type: ApplicationFiled: August 24, 2010Publication date: May 26, 2011Applicant: Rohm and Haas Electronic Materials LLCInventors: Michael K. GALLAGHER, Gerald B. Wayton, Gregory P. Prokopowicz, Stewart A. Robertson
-
Patent number: 7919222Abstract: Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred underlying coating compositions can exhibit enhanced etch rates in plasma etchants. Additional preferred coating compositions can enhance lithographic performance of an associated photoresist composition.Type: GrantFiled: January 26, 2007Date of Patent: April 5, 2011Assignee: Rohm and Haas Electronics Materials LLCInventors: Vaishali Raghu Vohra, James W. Thackeray, Gerald B. Wayton
-
Publication number: 20110033801Abstract: Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.Type: ApplicationFiled: May 18, 2010Publication date: February 10, 2011Applicant: Rohm and Haas Electronic Materials LLCInventors: Anthony Zampini, Gerald B. Wayton, Vipul Jain, Cong Liu, Suzanne Coley, Owendi Ongayi
-
Patent number: 7781141Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.Type: GrantFiled: July 1, 2005Date of Patent: August 24, 2010Assignee: Rohm and Haas Electronic Materials LLCInventors: Michael K. Gallagher, Gerald B. Wayton, Gregory P. Prokopowicz, Stewart A. Robertson
-
Patent number: 7585612Abstract: Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred coating compositions can enhance lithographic performance of an associated photoresist composition.Type: GrantFiled: July 5, 2006Date of Patent: September 8, 2009Assignee: Rohm and Haas Electronic Materials LLCInventors: James W. Thackeray, Gerald B. Wayton, Charles R. Szmanda
-
Patent number: 7582360Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.Type: GrantFiled: December 5, 2006Date of Patent: September 1, 2009Assignee: Rohm and Haas Electronic Materials LLCInventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
-
Publication number: 20070178406Abstract: Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred underlying coating compositions can exhibit enhanced etch rates in plasma etchants. Additional preferred coating compositions can enhance lithographic performance of an associated photoresist composition.Type: ApplicationFiled: January 26, 2007Publication date: August 2, 2007Applicant: Rohm and Haas Electronic Materials LLCInventors: Vaishali Raghu Vohra, James W. Thackeray, Gerald B. Wayton
-
Patent number: 7163751Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.Type: GrantFiled: May 12, 2004Date of Patent: January 16, 2007Assignee: Shipley Company, L.L.C.Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
-
Patent number: 6852421Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.Type: GrantFiled: September 26, 2002Date of Patent: February 8, 2005Assignee: Shipley Company, L.L.C.Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
-
Publication number: 20040209200Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.Type: ApplicationFiled: May 12, 2004Publication date: October 21, 2004Applicant: Shipley Company, L.L.C.Inventors: Gerald B. Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara
-
Publication number: 20040067437Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a component such as a resin that comprises an aryl dicarboxylate group. In a further aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that comprises a solvent component that comprises one or more oxyisobutyric acid esters such as methyl-2-hydroxyisobutyrate.Type: ApplicationFiled: October 6, 2002Publication date: April 8, 2004Applicant: Shipley Company, L.L.C.Inventors: Gerald B. Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara
-
Publication number: 20030180559Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.Type: ApplicationFiled: September 26, 2002Publication date: September 25, 2003Applicant: Shipley Company, L.L.C.Inventors: Gerald B. Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara