Abstract: A new approach to customer support that protects working artifacts through their entire lifecycle by provisioning, on-demand, a transient-controlled debugging environment that preferably is associated with a particular support issue (or subset of issues) when particular artifacts (e.g., files) are securely received at the service or software provider. This approach allows for complete (or substantially complete) isolation and control of the artifacts in a contained environment for so long as necessary by the provider. Preferably, the provider owns or otherwise manages the provisioned environment, which can be augmented as needed to meet the debugging requirements of the particular issue. Preferably, the provisioned environment is restricted in access to only those engineers or others with a verifiable need to know, or that have the necessary training and skill sets for the support operation required.

Abstract: A new approach to customer support that protects working artifacts through their entire lifecycle by provisioning, on-demand, a transient-controlled debugging environment that preferably is associated with a particular support issue (or subset of issues) when particular artifacts (e.g., files) are securely received at the service or software provider. This approach allows for complete (or substantially complete) isolation and control of the artifacts in a contained environment for so long as necessary by the provider. Preferably, the provider owns or otherwise manages the provisioned environment, which can be augmented as needed to meet the debugging requirements of the particular issue. Preferably, the provisioned environment is restricted in access to only those engineers or others with a verifiable need to know, or that have the necessary training and skill sets for the support operation required.

Abstract: Methods and apparatus are described for reticle particle calibration standards. A method includes making a reticle particle calibration standard including depositing a solution that includes a plurality of particles onto a first plate; drying the solution to evaporate a solvent; bonding the plurality of particles to the first plate; coupling a second plate to the first plate, the plurality of particles located between the first plate and the second plate, wherein the plurality of particles include a plurality of traceable standard particles of substantially known shape and size.

Abstract: Methods and apparatus are described for large substrate flat panel inspection systems. A method includes inspecting an object using a machine that includes an imaging device having an electronic shutter: scanning the imaging device across a surface of the object between a first location and a second location; strobing at least one light emitting diode to illuminate the object between the first location and the second location; and synchronizing operation of the electronic shutter with the strobed at least one light emitting diode, wherein i) strobing the at least one light emitting diode includes firing the at least one light emitting diode using at least one index mark located on the machine and ii) scanning includes continuously moving the imaging device between the first location and the second location.