Abstract: A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.

Abstract: A projection exposure system, intended in particular for microlithography, is used for generating, in an image plane, an image of a mask arranged in an object plane. The projection exposure system has a light source emitting projection light and projection optics arranged between the mask and the image. Starting from the mask, the following are arranged in the beam path of the projection optics: a first group of optical components with an overall positive refractive power; a second group of optical components with an overall negative refractive power; a third group of optical components with an overall positive refractive power; a fourth group of optical components with an overall negative refractive power, and, a fifth group of optical components with an overall positive refractive power. At least three optical subgroups having at least one optical component can be displaced along the optical axis of the projection optics.

Abstract: The invention relates to a load-carrying component that makes it possible to support a vehicle cross-member or module carrier on the floor region of the body of a motor vehicle. The load-carrying component serves to attach an air conditioning unit and is connected to as least one casing part of the air conditioning unit such that the load-carrying component and the casing create at least one channel through which conditioned air flows into the passenger compartment of the vehicle.

Abstract: A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.

Abstract: A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.

Abstract: The invention relates to a heating, ventilation and air conditioning (HVAC) system, particularly a flat, modular air conditioning unit for a motor vehicle, including an essentially box-shaped casing with a length y, a height z and a width x, and several air guiding and air distribution devices placed between an air inlet and an air outlet. Air conditioning devices, including a heat exchanger and a fan, are also provided. According to the invention the air conditioning devices are linearly arranged one after another along the length y of the casing. The heat exchanger is inclined relative to the length y of the casing by an angle a? and relative to the width x of the casing by an angle b? such that y>x>z.

Abstract: A projection exposure system, intended in particular for microlithography, is used for generating, in an image plane, an image of a mask arranged in an object plane. The projection exposure system has a light source emitting projection light and projection optics arranged between the mask and the image. Starting from the mask, the following are arranged in the beam path of the projection optics: a first group of optical components with an overall positive refractive power; a second group of optical components with an overall negative refractive power; a third group of optical components with an overall positive refractive power; a fourth group of optical components with an overall negative refractive power, and, a fifth group of optical components with an overall positive refractive power. At least three optical subgroups having at least one optical component can be displaced along the optical axis of the projection optics.

Abstract: A modular system for a 1-to-4 zone climate control system for vehicles, which is provided with at least one housing and several air tempering and air distribution devices including a fan, optionally a filter, an evaporator, a heater and several doors arranged at a partition that is placed orthogonal to the evaporator and provided to divide the total volume flow into two partial volume flows for the left and right vehicle sides. In the first configuration the partition is provided with several blind fittings for the closing of the flow paths associated with air outlets and air channels of a second configuration. In the second configuration, the blind fittings are replaced with additional doors enabling the use of the air outlets and air channels of additional zones.

Abstract: The invention provides a device for heating, ventilating and air conditioning in vehicles and includes a temperature flap arranged rotatable in the region of a hot air channel and a cold air channel. The temperature flap is designed to largely reduce the temperature dip of the mixed air in an outlet channel, with reference to an associated temperature/rotational position curve. The temperature flap includes a rotational plate with at least one flap opening and at least one dosing element assigned to the flap opening. In the region of the closing element, an opening mechanism, dependent on the rotational position of the temperature flap, actuates the dosing element and opens the flap opening.

Abstract: The present invention involves a compact vehicle temperature control system. The system includes a housing, an evaporator core and a heater core disposed in the housing, and a separation wall disposed between the evaporator core and heater core. The housing has an intake opening for air intake and an output opening for output air. The evaporator core is in fluid communication with the intake opening. The heater core is disposed downstream from the evaporator core and in fluid communication with the evaporator core, defining a space between the evaporator core and the heater core. The heater core has a first portion and a second portion. The separation wall has a first end and a second end. The first end is attached to the first portion of the heater core and extends therefrom along the length of the heater core in the space between the evaporator core and the heater core.

Abstract: In a system for flushing at least one internal space of an objective, in particular an exposure projection objective for semiconductor lithography, flushing is performed by mixing at least two inert gasses in such a way that the refractive index resulting therefrom corresponds at least approximately to the refractive index of air.

Abstract: The invention relates to a heating and air conditioning plant for motor vehicles. The plant includes an evaporator to create cold air, a heating heat exchanger to create warm air, a mixing space to mix warm and cold air in direction of flow of the air channel system and from which the air is directed to the air conditioning zones to be differently tempered through suitable air directing devices and air outlet devices. In longitudinal direction of the vehicle, the evaporator is arranged longitudinal in the bottom region of the instrument panel center console and connected via the air directing channel system to the heating heat exchanger positioned above the evaporator and oriented almost horizontal. The air mixing chamber is configured as parallel-symmetric air guiding system with trapezoidal ducts to deviate the air flows for the left and right air outlets above the heating heat exchanger.

Abstract: A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.

Abstract: A projection exposure system, intended in particular for microlithography, is used for generating, in an image plane, an image of a mask arranged in an object plane. The projection exposure system has a light source emitting projection light and projection optics arranged between the mask and the image. Starting from the mask, the following are arranged in the beam path of the projection optics: a first group of optical components with an overall positive refractive power; a second group of optical components with an overall negative refractive power; a third group of optical components with an overall positive refractive power; a fourth group of optical components with an overall negative refractive power, and, a fifth group of optical components with an overall positive refractive power. At least three optical subgroups having at least one optical component can be displaced along the optical axis of the projection optics.

Abstract: In a system for flushing at least one internal space of an objective, in particular an exposure projection objective for semiconductor lithography, flushing is performed by mixing at least two inert gasses in such a way that the refractive index resulting therefrom corresponds at least approximately to the refractive index of air.

Abstract: The present invention provides a transformed yeast strain containing a DNA sequence transcriptionally linked to a promoter functional in such yeast cells, which when expressed in a suitable host cell, encodes at least one polypeptide having riboflavin biosynthetic activity. Using such transformants, improved levels of riboflavin production are achieved. Processes of producing riboflavin from such transformants are also provided.

Abstract: An illumination system for an optical system such as a microlithographic projection exposure system includes a zoom lens 2 for varying the degree of coherence .sigma. and two axicons (22, 23) with an adjustable distance therebetween. The distance can preferably be reduced to zero. The illumination system provides continuous, conventional illumination with a variable degree of coherence .sigma. and annular illumination or multipole illumination with different geometries with low losses of light.