Abstract: A system is disclosed for compensating for the offset voltage problem which occurs in certain types of differential amplifiers; a differential amplifier, in the form of an operational amplifier, is provided with two generators of input signals whose difference is to be amplified; further included is an offset voltage compensation loop comprising a comparator, an n-bit up/down counter and a digital analog converter means; the output of said means being connected to said generators of input signals so as to modulate the input signals; and said digital analog converter means including first and second n-1 bit digital analog converters.

Abstract: An implanted resistor structure for semiconductor integrated circuit devices is formed by a double ion-implantation providing a high breakdown voltage resistor.

Abstract: Arrangements are described for correcting the voltage coefficient of resistance (VCR) of resistors integral with a semiconductor body and, more particularly, for correcting the VCR of resistors implanted in a semi-conductor body. Resistors typically comprising a resistive region of a first conductivity type formed in an isolated layer of opposite conductivity type which isolated layer, in general, includes an epitaxial layer passivated by a dielectric layer. A metal layer is formed on the dielectric layer and covers, at least partially, the resistive layer. The metal layer is brought to a suitable potential to produce opposite variations in the resistance with respect to variations created by the epitaxial layer.