Abstract: Thermal imaging donors are useful for thermal transfer patterning of a metal layer and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry fabrication of electronic devices. Also provided are patterned multilayer compositions comprising one or more base film(s), and one or more patterned metal layers. These include electromagnetic interference shields and touchpad sensors.

Abstract: Metal compositions including silver compositions are used in preparing thermal imaging donors. The donors are useful for thermal transfer patterning of a metal layer and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry fabrication of electronic devices. Also provided are patterned multilayer compositions comprising one or more base film(s), and one or more patterned metal layers, including EMI shields and touchpad sensors.

Abstract: The invention is related to thermal imageable dielectric layers and thermal transfer donors and receivers comprising dielectric layers. The thermal transfer donors are useful in making electronic devices by thermal transfer of dielectric layers having excellent resistivity, good transfer properties and good adhesion to a variety of receivers.

Abstract: The invention provides metal compositions, including silver compositions, and thermal imaging donors prepared with the compositions. The donors are useful for thermal transfer patterning of a metal layers and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry fabrication of electronic devices. Also provided are patterned multilayer compositions comprising one or more base film(s), and one or more patterned metal layers, including EMI shields and touchpad sensors.

Abstract: The invention provides metal compositions, including silver compositions, and thermal imaging donors prepared with the compositions. The donors are useful for thermal transfer patterning of a metal layers and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry fabrication of electronic devices. Also provided are patterned multilayer compositions comprising one or more base film(s), and one or more patterned metal layers, including EMI shields and touchpad sensors.

Abstract: The invention relates to thin film transistors comprising novel dielectric layers and novel electrodes comprising metal compositions that can be provided by a dry thermal transfer process.

Abstract: The invention relates to thin film transistors comprising novel dielectric layers and novel electrodes comprising metal compositions that can be provided by a dry thermal transfer process.

Abstract: The invention relates to thin film transistors comprising novel dielectric layers and novel electrodes comprising metal compositions that can be provided by a dry thermal transfer process.

Abstract: The invention provides metal compositions, including silver compositions, and thermal imaging donors prepared with the compositions. The donors are useful for thermal transfer patterning of a metal layers and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry fabrication of electronic devices. Also provided are patterned multilayer compositions comprising one or more base film(s), and one or more patterned metal layers, including EMI shields and touchpad sensors.

Abstract: A sealing mechanism for a gas chromatograph machine includes a weldment attachment mountable at the weldment assembly of the machine. The attachment has a passage therethrough for gas communicated to the weldment assembly. An actuator imparts a direct force on the weldment attachment to move it linearly towards an injection port of the machine and to sealingly clamp the weldment attachment onto the port. Torsional forces are not applied on the weldment attachment by the actuator.

Abstract: A process of producing a bimodal polyolefin composition is described, which includes in one embodiment contacting monomers with a supported bimetallic catalyst composition for a time sufficient to form a bimodal polyolefin composition that includes a high molecular weight polyolefin component and a low molecular weight polyolefin component; wherein the supported bimetallic catalyst includes a first catalyst component that is preferably non-metallocene, and a second catalyst component that includes a metallocene catalyst compound having at least one fluoride or fluorine containing leaving group, wherein the bimetallic catalyst is supported by an enhanced silica, dehydrated at a temperature of 800° C. or more in one embodiment.

Abstract: A process of producing a bimodal polyolefin composition is described, which includes in one embodiment contacting monomers with a supported bimetallic catalyst composition for a time sufficient to form a bimodal polyolefin composition that includes a high molecular weight polyolefin component and a low molecular weight polyolefin component; wherein the supported bimetallic catalyst includes a first catalyst component that is preferably non-metallocene, and a second catalyst component that includes a metallocene catalyst compound having at least one fluoride or fluorine containing leaving group, wherein the bimetallic catalyst is supported by an enhanced silica, dehydrated at a temperature of 800° C. or more in one embodiment.

Abstract: A process of producing a bimodal polyolefin composition is described, which includes in one embodiment contacting monomers with a supported bimetallic catalyst composition for a time sufficient to form a bimodal polyolefin composition that includes a high molecular weight polyolefin component and a low molecular weight polyolefin component; wherein the supported bimetallic catalyst includes a first catalyst component that is preferably non-metallocene, and a second catalyst component that includes a metallocene catalyst compound having at least one fluoride or fluorine containing leaving group, wherein the bimetallic catalyst is supported by an enhanced silica, dehydrated at a temperature of 800° C. or more in one embodiment.