Patents by Inventor Gerard Stephen Moloney

Gerard Stephen Moloney has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head
    Publication number: 20080051011
    Abstract: Embodiments of a retaining ring for use with a chemical mechanical polishing process with a body including a polyethylene terephthalate polymer or polymer including ethylene terephthalate monomers are disclosed.
    Type: Application
    Filed: October 2, 2006
    Publication date: February 28, 2008
    Inventors: Gerard Stephen Moloney, Peter Lao
  • Chemical mechanical polishing and pad dressing method
    Patent number: 7004822
    Abstract: The invention provides a chemical mechanical polishing and pad dressing method based on differing the rotational of a pad dresser, head, and/or polishing pad to improve center removal slow profiling.
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: February 28, 2006
    Assignee: Ebara Technologies, Inc.
    Inventors: Gerard Stephen Moloney, Huey-Ming Wang, Peter Lao
  • Chemical mechanical polishing apparatus having a stepped retaining ring and method for use thereof
    Patent number: 6916226
    Abstract: A chemical mechanical processing apparatus includes a polishing pad capable of polishing a substrate; a stepped retaining having an inner side, a bottom side, and an open region, the open region extending radially outward from the inner side and upward from the bottom side, the open region providing space for pad rebound, the open region further having a plurality of tips to hold a substrate in position during rotation of the substrate against the polishing pad, the stepped retaining ring capable of rotating the substrate against the polishing pad; and a dispenser capable of dispensing a slurry onto the pad.
    Type: Grant
    Filed: December 13, 2002
    Date of Patent: July 12, 2005
    Assignee: Ebara Technologies, Inc.
    Inventors: Gerard Stephen Moloney, Huey-Ming Wang
  • Chemical mechanical polishing and pad dressing method
    Publication number: 20040023602
    Abstract: The invention provides a chemical mechanical polishing and pad dressing method based on differing the rotational of a pad dresser, head, and/or polishing pad to improve center removal slow profiling.
    Type: Application
    Filed: February 28, 2003
    Publication date: February 5, 2004
    Applicant: Ebara Technologies Incorporated
    Inventors: Gerard Stephen Moloney, Huey-Ming Wang, Peter Lao
  • Chemical mechanical polishing apparatus having a stepped retaining ring and method for use thereof
    Publication number: 20030224703
    Abstract: A chemical mechanical processing apparatus includes a polishing pad capable to polish a substrate; a stepped retaining having an inner side, a bottom side, and an open region, the open region extending radially outward from the inner side and upward from the bottom side, the open region providing space for pad rebound, the open region further having a plurality of tips to hold a substrate in position during rotation of the substrate against the polishing pad, the stepped retaining ring capable to rotate the substrate against the polishing pad; and a dispenser capable to dispense a slurry onto the pad.
    Type: Application
    Filed: December 13, 2002
    Publication date: December 4, 2003
    Applicant: Ebara Technologies, Inc.
    Inventors: Gerard Stephen Moloney, Huey-Ming Wang