Patents by Inventor Gerardus Baas

Gerardus Baas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070170376
    Abstract: An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device may be provided to adjust the members in such a manner as to control attenuation of a radiation beam projected onto a target portion of a substrate across the cross-section of the radiation beam.
    Type: Application
    Filed: November 2, 2006
    Publication date: July 26, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hendrik Neerhof, Hako Botma, Marius Ravensbergen, Gerardus Baas