Patents by Inventor Gerardus Carolus Hofmans

Gerardus Carolus Hofmans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, calibration method, device manufacturing method and computer program product
    Publication number: 20070181827
    Abstract: Calibration of spot height offsets in a level sensor is performed on a resist-coated substrate to eliminate process dependencies of substrate position measurements obtained by the level sensor.
    Type: Application
    Filed: February 7, 2006
    Publication date: August 9, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeffrey Godefridus Tempelaars, Gerardus Carolus Hofmans, Rene Oesterholt, Jan Hauschild, Hans Kattouw
  • Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle
    Publication number: 20050140949
    Abstract: A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
    Type: Application
    Filed: April 30, 2004
    Publication date: June 30, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Jasper, Marcel Baggen, Richard Bruls, Orlando Cicilia, Hendrikus Alphonsus Van Dijck, Gerardus Carolus Hofmans, Albert Johannes Jansen, Carlo Cornelis Luijten, Willem Pongers, Martijn Dominique Wehrens, Tammo Uitterdijk, Herman Boom, Marcel Johannes Louis Demarteau