Patents by Inventor Gerardus Fernandus Ten Berge

Gerardus Fernandus Ten Berge has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Charged particle optical system comprising an electrostatic deflector
    Patent number: 8110813
    Abstract: A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The electrostatic deflector comprises first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets, the electrodes being at least partially freestanding in an active area of the electrostatic deflector. The electrodes define at least one passing window for passage of at least a portion of the beamlets between the electrodes, the passing window having a length in a first direction and a width in a transverse direction. The system is adapted to arrange the beamlets in at least one row and to direct a single row of the beamlets through the passing window of the electrostatic deflector, the beamlets of the row extending in the first direction.
    Type: Grant
    Filed: April 29, 2010
    Date of Patent: February 7, 2012
    Assignee: Mapper Lithography IP B.V.
    Inventors: Norman Hendrikus Rudolf Baars, Gerardus Fernandus Ten Berge, Stijn Willem Herman Karel Steenbrink
  • Charged particle optical system comprising an electrostatic deflector
    Publication number: 20100276606
    Abstract: A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The electrostatic deflector comprises first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets, the electrodes being at least partially freestanding in an active area of the electrostatic deflector. The electrodes define at least one passing window for passage of at least a portion of the beamlets between the electrodes, the passing window having a length in a first direction and a width in a transverse direction. The system is adapted to arrange the beamlets in at least one row and to direct a single row of the beamlets through the passing window of the electrostatic deflector, the beamlets of the row extending in the first direction.
    Type: Application
    Filed: April 29, 2010
    Publication date: November 4, 2010
    Applicant: Mapper Lithography IP B.V.
    Inventors: Norman Hendrikus Rudolf BAARS, Gerardus Fernandus Ten Berge, Stijn Willem Herman Karel Steenbrink