Abstract: A radiation source is disclosed that comprises a reservoir that retains a volume of fuel, a nozzle configured to direct a stream of fuel towards a plasma formation location, a laser configured to generate a radiation generating plasma, and a fuel contamination control arrangement. The contamination control arrangement comprises a magnetic field generation element for generating a magnetic field; an electric field generation element for generating an electric field, the magnetic field generation element and the electric field generation element together configured to ensure that the magnetic field and the electric field overlap at a location of contamination within the fuel, and to ensure that lines of flux of the magnetic field and electric field are non-parallel at that location to control movement of the contamination.

Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.

Abstract: A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.

Abstract: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

Abstract: A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.

Abstract: A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.

Abstract: An EUV radiation source that includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a reservoir configured to hold fuel at a temperature that is sufficiently high to maintain the fuel in liquid form, and a pressure vessel configured to contain the reservoir, the pressure vessel being at least partially thermally isolated from the reservoir. The EUV radiation source also includes a laser radiation source configured to irradiate fuel supplied by the fuel supply at the plasma formation location.

Abstract: An EUV radiation source includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a nozzle configured to eject droplets of fuel, and a droplet accelerator configured to accelerate the fuel droplets. The EUV radiation source includes a laser radiation source configured to irradiate the fuel supplied by the fuel supply at the plasma formation location.

Abstract: An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.

Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

Abstract: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.

Abstract: A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.

Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.

Abstract: A lithographic apparatus includes a source module that include a collector and a radiation source. The collector is configured to collect radiation from the radiation source. An illuminator is configured to condition the radiation, collected by the collector and to provide a radiation beam. A detector is disposed in a fixed positional relationship with respect to the illuminator. The detector is configured to determine a position of the radiation source relative to the collector and a position of the source module relative to the illuminator.

Abstract: An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium.

Abstract: A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region.

Abstract: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

Abstract: A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.

Abstract: A laser device includes a seed laser, an amplifier, a detector, and an optical element arranged to direct radiation emitted by the seed laser towards a plasma generation site. The optical element is arranged to direct towards the detector amplified spontaneous emission radiation which has been emitted by the seed laser and has been reflected from a droplet of fuel material. The detector is arranged to trigger generation of a laser radiation pulse by the seed laser when the reflected amplified spontaneous emission radiation is detected.