Patents by Inventor Gerardus Martinus Antonius De Rooij

Gerardus Martinus Antonius De Rooij has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, removable member and device manufacturing method
    Patent number: 8823919
    Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: September 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Nina Vladimirovna Dziomkina, Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Vijay Kumar Badam, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf
  • Lithographic apparatus, removable member and device manufacturing method
    Patent number: 8659741
    Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: February 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Nina Vladimirovna Dziomkina, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf, Vijay Kumar Badam
  • LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD
    Publication number: 20110199592
    Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
    Type: Application
    Filed: November 15, 2010
    Publication date: August 18, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Roelof Frederik De Graff, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Nina Vladimirovna Dziomkina, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf, Vijay Kumar Badam
  • LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD
    Publication number: 20110116060
    Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
    Type: Application
    Filed: November 15, 2010
    Publication date: May 19, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Nina Vladimirovna Dziomkina, Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Vijay Kumar Badam, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf
  • Lithographic apparatus, position quantity detection system and method
    Patent number: 7271917
    Abstract: A lithographic apparatus includes a position quantity determination system to determine a position quantity of a movable part which is in operation at least partly surrounded by an area comprising a fluid. The position quantity determination system includes an interferometer system, a global sensor to determine a global value of a physical quantity of the fluid in the area, and a local sensor to determine a local value of the physical quantity of the fluid in the part of the area. The position quantity determination system is configured to determine the position quantity from an output of the interferometer, the global value of the physical quantity and the local value of the physical quantity. The physical quantity may include a pressure, a temperature, etc. The local physical quantity determination system may include a sensor, such as a high-speed sensor, a computational fluid dynamics model or a linear approximation model.
    Type: Grant
    Filed: May 3, 2005
    Date of Patent: September 18, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Edwin Teunis Van Donkelaar, Evert Hendrink Jan Draaijer, Leon Martin Levasier, Nicolas Alban Lallemant, Gerardus Martinus Antonius De Rooij