Patents by Inventor Gerardus Van Nunen

Gerardus Van Nunen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20050007569
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Application
    Filed: May 13, 2004
    Publication date: January 13, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Levinus Bakker, Johannes Baselmans, Hendrikus Cox, Antonius Theodorus Derksen, Sjoerd Donders, Christiaan Hoogendam, Joeri Lof, Erik Loopstra, Jeroen Johannes Mertens, Frits Van Der Meulen, Johannes Mulkens, Gerardus Van Nunen, Klaus Simon, Bernardus Slaghekke, Alexander Straaijer, Jan-Gerard Van Der Toorn, Martijn Houkes