Abstract: Specimen control means are disclosed for use with multipurpose particle beam instruments, such as with SEM, ESEM, TESEM, TEM, ETEM and ion microscopes. It provides a control stage located outside a chamber with a flexible wall that allows specimen movement inside the chamber. The same stage can open or close the bottom of the chamber base carrying a specimen stub, which is transferred to and from a conveyor belt or carousel supplied with a multitude of stubs filled with new specimens for examination. The chamber is further supplied with directed gas controls to regulate its gaseous environment. There is a supply of clean gas to maintain the instrument and specimen free of contamination, or to provide a reactant gas for microfabrication, or to enhance signal detection in a microscope. Stationary charged particle beam instruments are equipped with micro-mechanical specimen scanning for use in ultra-high resolution particle beam technologies.

Abstract: Atmospheric scanning electron microscope achieves a wide field of view at low magnifications in a broad range of gaseous pressure, acceleration voltage and image resolution. This is based on the use of a reduced size pressure limiting aperture together with a scanning beam pivot point located at the small aperture at the end of electron optics column. A second aperture is located at the principal plane of the objective lens. Double deflection elements scan and rock the beam at a pivot point first at or near the principal plane of the lens while post-lens deflection means scan and rock the beam at a second pivot point at or near aperture at the end of the optics column. The aperture at the first pivot may act also as beam limiting aperture.

Abstract: Atmospheric scanning electron microscope achieves a wide field of view at low magnifications in a broad range of gaseous pressure, acceleration voltage and image resolution. This is based on the use of a reduced size pressure limiting aperture together with a scanning beam pivot point located at the small aperture at the end of electron optics column. A second aperture is located at the principal plane of the objective lens. Double deflection elements scan and rock the beam at a pivot point first at or near the principal plane of the lens while post-lens deflection means scan and rock the beam at a second pivot point at or near aperture at the end of the optics column. The aperture at the first pivot may act also as beam limiting aperture.

Abstract: The invention provides for a scanning electron or ion beam instrument capable of transferring the beam from a high vacuum chamber (8) into a high pressure chamber (5) via aperture (1) and aperture (2). The beam is deflected and scanned by coils (3) generally positioned between apertures (1) and (2). The amplitude of deflection of the beam over a specimen placed inside chamber (5) is substantially larger than the diameter of aperture (1). Leaking gas through aperture (1) is removed via port (7) by appropriate pumping apparatus. The size of aperture (1) is such that the pressure in chamber (6) combined with the supersonic jet and shock waves naturally forming therein do not result in catastrophic electron beam loss in chamber (6). The addition of appropriate detection means result in an instrument characterised by superior performance over prior art by way of better field of view at low magnification, better vacuum system and improved detection and imaging capabilities.

Abstract: The invention provides for a scanning electron or ion beam instrument capable of transferring the beam from a high vacuum chamber (8) into a high pressure chamber (5) via aperture (1) and aperture (2). The beam is deflected and scanned by coils (3) generally positioned between apertures (1) and (2). The amplitude of deflection of the beam over a specimen placed inside chamber (5) is substantially larger than the diameter of aperture (1). Leaking gas through aperture (1) is removed via port (7) by appropriate pumping apparatus. The size of aperture (1) is such that the pressure in chamber (6) combined with the supersonic jet and shock waves naturally forming therein do not result in catastrophic electron beam loss in chamber (6). The addition of appropriate detection means result in an instrument characterised by superior performance over prior art by way of better field of view at low magnification, better vacuum system and improved detection and imaging capabilities.

Abstract: An alternating electromagnetic field in the radiofrequency range is applied in a gaseous environment (4). Free electrons produced in the gas (4), by an ionising source of radiation (5) or by interaction of a charged particle beam with a specimen, are acted upon by the alternating electromagnetic field and undergo an oscillatory motion resulting in multiple collisions with the gas molecules or atoms. Amplified electron and photon signals are generated in a controlled discharge, proportional to the initial number of free electrons, and are collected by suitable means (6, 7, 8). The alternating field is generated either by electrodes (1, 2) biased with an alternating voltage, or by a coil driven by an AC current, and may be superposed with a static electric field. The detection device may be used with instruments such as electron microscopes, in ion beam technologies, and with instruments used for detection of ionising radiations such as proportional counters.

Abstract: An aperture (5) connects a first chamber (1) with a second chamber (2), and is surrounded by an annular nozzle (7) formed by inner and outer walls (6, 8), which connects the first chamber (1) with a third chamber (3). A supersonic annular gas jet (9) is ejected by the annular nozzle (7) into the first chamber (1), creating a Venturi pumping action at the core of the jet in the vicinity of the aperture (5). The second chamber (2) may thus be maintained at a substantially lower pressure than the first chamber (1). Inner wall (6) and outer wall (8) may be relatively movable for varying gas flow, and the first chamber (1) may include baffles or skimmers to modify gas flow, e.g., to create a high density molecular beam. An electron or ion beam (4) may be transferred from the second chamber (2) to the first chamber (1), e.g., as part of an environmental scanning electron microscope.