Patents by Inventor Gerben Frank DE LANGE

Gerben Frank DE LANGE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method
    Patent number: 10088756
    Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.
    Type: Grant
    Filed: June 4, 2015
    Date of Patent: October 2, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Kerssemakers, Wilhelmus Petrus De Boeij, Gerben Frank De Lange, Christiaan Alexander Hoogendam, Petrus Franciscus Van Gils, Jelmer Mattheüs Kamminga, Jan Jaap Kuit, Carolus Johannes Catharina Schoormans
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20170199467
    Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.
    Type: Application
    Filed: June 4, 2015
    Publication date: July 13, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Sander KERSSEMAKERS, Wilhelmus Petrus DE BOEIJ, Gerben Frank DE LANGE, Christiaan Alexander HOOGENDAM, Petrus Franciscus VAN GILS, Jelmer Mattheus KAMMINGA, Jan Jaap KUIT, Carolus Johannes Catharina SCHOORMANS
  • LITHOGRAPHIC APPARATUS AND SCANNING METHOD
    Publication number: 20110216301
    Abstract: A lithographic apparatus includes a first support to support a first patterning device; a second support to support a second patterning device, each of the first and the second patterning device capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system to project the patterned radiation beam onto a target portion of the substrate; a controller to drive the first support and the second support and arranged to: drive the first support to perform a scanning movement; drive the second support to accelerate during at least part of the scanning movement of the first support; and drive the second support to perform a scanning movement upon completion of the scanning movement of the first support, so as to scan a die adjacent a die previously scanned during the scanning movement of the first support.
    Type: Application
    Filed: February 7, 2011
    Publication date: September 8, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gerben Frank DE LANGE, Johannes Catharinus Hubertus Mulkens