Abstract: A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a particle-optical imaging is characterizable by at least two parameters. The method also includes determining a matrix A, and determining a matrix S. The method further includes defining values of parameters which characterize a desired imaging, and providing a second setting of the effects of the components in such a way that the particle-optical imaging is characterizable by the parameters having the defined values.

Abstract: A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a particle-optical imaging is characterizable by at least two parameters. The method also includes determining a matrix A, and determining a matrix S. The method further includes defining values of parameters which characterize a desired imaging, and providing a second setting of the effects of the components in such a way that the particle-optical imaging is characterizable by the parameters having the defined values.

Abstract: A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a particle-optical imaging is characterizable by at least two parameters. The method also includes determining a matrix A, and determining a matrix S. The method further includes defining values of parameters which characterize a desired imaging, and providing a second setting of the effects of the components in such a way that the particle-optical imaging is characterizable by the parameters having the defined values.

Abstract: An electron microscope includes an electron beam source, a first electromagnet, a second electromagnet and a detector. The field generated by the first electromagnet has an effect of three lenses subsequently arranged along the beam path. A first lens of these lenses is arranged upstream of the object plane and focuses the beam at the object plane. The second lens of these three lenses is arranged downstream of the object plane. The third lens of these three lenses generates an image of a diffraction plane of the second lens at the detector. The magnetic field generated by the second electromagnet has an effect of a fourth lens and can be changed in order to change a size of the image of the diffraction plane of the second lens on the detector.

Abstract: A particle optical system comprises a beam generating system (3) configured to generate a plurality of particle beams (5) and to direct the plurality of particle beams (5) onto an object plane (7), a first deflector arrangement (35) arranged in the beam path of the particle beams (5) upstream of the object plane (7) and configured to deflect the plurality of particle beams (5) before they are incident on the object plane (7), an object holder (15) configured to hold an object (17) to be inspected in the object plane (7), a plurality of detectors (27) configured to receive and to detect the plurality of particle beams (5) having traversed the object plane (7), wherein the detectors are arranged in a detection plane (21) on a side of the object plane (7) opposite to the beam generating system (3), at least one first particle optical lens (19) configured to collect particles of the particle beams emanating from the object plane on the detectors (27), and a controller (31) configured to control the first deflecto

Abstract: A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a particle-optical imaging is characterizable by at least two parameters. The method also includes determining a matrix A, and determining a matrix S. The method further includes defining values of parameters which characterize a desired imaging, and providing a second setting of the effects of the components in such a way that the particle-optical imaging is characterizable by the parameters having the defined values.

Abstract: An electron microscope includes an electron beam source, a first electromagnet, a second electromagnet and a detector. The field generated by the first electromagnet has an effect of three lenses subsequently arranged along the beam path. A first lens of these lenses is arranged upstream of the object plane and focuses the beam at the object plane. The second lens of these three lenses is arranged downstream of the object plane. The third lens of these three lenses generates an image of a diffraction plane of the second lens at the detector. The magnetic field generated by the second electromagnet has an effect of a fourth lens and can be changed in order to change a size of the image of the diffraction plane of the second lens on the detector.

Abstract: A particle optical system comprises a beam generating system (3) configured to generate a plurality of particle beams (5) and to direct the plurality of particle beams (5) onto an object plane (7), a first deflector arrangement (35) arranged in the beam path of the particle beams (5) upstream of the object plane (7) and configured to deflect the plurality of particle beams (5) before they are incident on the object plane (7), an object holder (15) configured to hold an object (17) to be inspected in the object plane (7), a plurality of detectors (27) configured to receive and to detect the plurality of particle beams (5) having traversed the object plane (7), wherein the detectors are arranged in a detection plane (21) on a side of the object plane (7) opposite to the beam generating system (3), at least one first particle optical lens (19) configured to collect particles of the particle beams emanating from the object plane on the detectors (27), and a controller (31) configured to control the first deflecto

Abstract: A transmission electron microscopy system has an illumination system and an objective lens system. A first projection system images the diffraction plane of the objective lens system into a first intermediate diffraction plane. A second projection system images the first intermediate diffraction plane into a second intermediate diffraction plane. A first aperture located in the first intermediate diffraction plane has a central opening of a first radius. A bright field detector located in the second intermediate diffraction plane has a detection surface defined by an inner edge of a second radius. The first radius and the second radius define a maximum angle and a minimum angle, respectively, relative to the optical axis of directions of bright field electrons traversing the sample plane and detectable by the bright field detector.

Abstract: A transmission electron microscope in which a sample is positioned in a sample plane 9b comprises an objective lens 11b, a first projection lens system 61b having plural lenses, a second projection lens 63b system having plural lenses, and an analyzing system. The sample plane 9b is imaged into an intermediate image plane 71, a diffraction plane 15b of the objective lens 11b is imaged into an intermediate diffraction plane 67b, and either a) the intermediate image plane is imaged into an entrance image plane of the analyzing system and the intermediate diffraction plane is imaged into an entrance pupil plane of the analyzing system, or b) the intermediate image plane 71 is imaged into the entrance pupil plane 65b and the intermediate diffraction plane 67b is imaged into the entrance image plane 21b.

Abstract: A transmission electron microscopy system comprises: an illumination system (2), an objective lens system (13), a first projection system (21) imaging the diffraction plane (15) objective lens system into a first intermediate diffraction plane (25), a second projection system (41) imaging the first intermediate diffraction plane into a second intermediate diffraction plane (43), a first aperture (27) located in the first intermediate diffraction plane and having a central opening of a first radius (r1), and a bright field detector (45) located in the second intermediate diffraction plane and having a detection surface defined by an inner edge (49) of a second radius (r2), wherein the first radius and the second radius define a maximum angle and a minimum angle, respectively, relative to the optical axis of directions of bright field electrons traversing the sample plane and detectable by the bright field detector.

Abstract: An apparatus for contaminants being deposited thereon in a particle beam device, and also the particle beam device including the apparatus, are provided. This apparatus may be an anticontaminator. The apparatus according to the system described herein may include at least one cooling unit. The cooling unit may provide at least one cooled surface on which contaminants in a particle beam device are deposited. The apparatus according to the system described herein may further include at least one aperture unit. The aperture unit may be arranged at a motion device for moving the aperture unit relative to the cooling unit. Furthermore, the aperture unit may have at least one aperture opening. The cooling unit may be connected to the aperture unit by at least one first flexible thermal conductor.

Abstract: A charged particle beam system for performing precession diffraction includes a lens 11 for focusing a beam 5 in an object plane 9, and an objective lens 13 having a diffraction plane 27. A doublet 53 of lenses 35, 63 images the diffraction plane 27 into an intermediate diffraction plane 69 where a multipole 55 is located. A doublet 57 of lenses 65, 93 images the intermediate diffraction plane 69 into an intermediate diffraction plane 71 where a multipole 59 is located. A first deflection system 15 upstream of the object plane 9 can tilt to change an angle of incidence of the beam on the object plane. A second deflection system 37 between lenses 35 and 63 tilts the beam such that the change of the angle of incidence of the charged particle beam on the object plane is compensated.

Abstract: A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle ?1 between a first straight line 551 extending through the point of intersection 51 and a center of the first substrate 351 and the object plane 19 differs from a second elevation angle ?2 between a second straight line 552 extending through the point of intersection 51 and a center of the second substrate 352 and the object plane 19 by more than 14°.

Abstract: A particle beam microscope includes an illumination system generating a particle beam having a ring-shaped conical configuration. A selective detection system is configured to selectively detect one of two groups of particles having traversed the object region. The first group of particles includes the particles that traversed the object region un-scattered or scattered by a small scattering amount. The second group of particles includes particles scattered in the object region by a greater scattering amount.

Abstract: A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a particle beam device having a phase-shifting element of this type. In the phase-shifting element and the particle beam device having a phase-shifting element, components shadowing the particle beam are avoided, so that proper information content is achieved and in which the phase contrast is essentially spatial frequency-independent. The phase-shifting element may have at least one means for generating a non-homogeneous or anisotropic potential. The particle beam device according to the system described herein may be provided with the phase-shifting element.

Abstract: An electron beam device has an electron gun for generating an electron beam, an objective lens for focusing the electron beam on an object and at least one detector for detecting electrons emitted by the object or electrons backscattered by the object. Detection of electrons emitted by or backscattered by an object may be simplified and improved using quadrupole devices and certain configurations of these devices provided in the electron beam device.

Abstract: A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a particle beam device having a phase-shifting element of this type. In the phase-shifting element and the particle beam device having a phase-shifting element, components shadowing the particle beam are avoided, so that proper information content is achieved and in which the phase contrast is essentially spatial frequency-independent. The phase-shifting element may have at least one means for generating a non-homogeneous or anisotropic potential. The particle beam device according to the system described herein may be provided with the phase-shifting element.

Abstract: A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle ?1 between a first straight line 551 extending through the point of intersection 51 and a centre of the first substrate 351 and the object plane 19 differs from a second elevation angle ?2 between a second straight line 552 extending through the point of intersection 51 and a centre of the second substrate 352 and the object plane 19 by more than 14°.

Abstract: A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle ?1 between a first straight line 551 extending through the point of intersection 51 and a center of the first substrate 351 and the object plane 19 differs from a second elevation angle ?2 between a second straight line 552 extending through the point of intersection 51 and a center of the second substrate 352 and the object plane 19 by more than 14°.