Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract: A method for producing one or more coating on a displaccable substrate in a vacuum chamber with the aid of a residual gas, by means of a sputtering device said coating being formed from at least two constituents, whereby a sputtering material of the sputtering device constitutes at least one first constituent and a reactive component of the residual gas constitutes a second constituent.

Abstract: The invention relates to a cathode system for sputtering apparatus which includes a target plate of ferromagnetic material. A magnet system is situated behind the target plate and has opposed poles positioned so that at least a portion of the lines of force emerging from the poles passes out through the target and returns thereto. The target is placed on a floor which includes strips of ferromagnetic material in the area of the poles of the magnet system. These strips close the magnetic circuit between the magnet system and the target plate. The remainder of the floor is made of nonmagnetic material.

Abstract: A magnetron cathode for cathodic evaporation apparatus with a target holder (10) for releasably securing a plate-like target (9). The associated magnet arrangement (7) has pole faces (7c, 7d) for producing at least one circumferentially closed tunnel of magnetic field lines which overlaps the target. The magnet arrangement (7) is accommodated in a housing of non-ferromagnetic material which extends over the pole faces.

Abstract: A high-voltage power supply for an electron-beam gun with a heatable cathode and an anode and of the type having an electronic switch connected in the current circuit for the cathode and controllable for blocking the current to the cathode, includes an impulse protecting filter connected in the current circuit for the cathode. The filter comprises a capacitor connected in parallel to the cathode, a choke connected in series with the cathode current circuit, a blocking diode and a discharge resistor connected in series therewith, with the diode and resistor connected in parallel with the choke.