Patents by Inventor Gerd Fürter

Gerd Fürter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Catadioptric objective comprising two intermediate images
    Patent number: 6600608
    Abstract: An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a second partial objective, a second intermediate image, and a third partial objective. At least one of the partial objectives is purely refractive. One of the partial objectives is purely refractive and one is purely catoptric.
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: July 29, 2003
    Assignee: Carl-Zeiss-Stiftung
    Inventors: David R. Shafer, Alois Herkommer, Karl-Heinz Schuster, Gerd Fürter, Rudolf von Bünau, Wilhelm Ulrich
  • Projection exposure system having a reflective reticle
    Patent number: 6590718
    Abstract: A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illuminating beam path (100) and the imaging beam path (200). In order to obtain an almost telecentric entry at the reticle, optical elements (71) are provided between beam splitter cube (3) and the reflective reticle (5). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube (3) whose fourth unused side can be used for coupling in light. The illuminating beam path (100) can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate.
    Type: Grant
    Filed: February 2, 2001
    Date of Patent: July 8, 2003
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Gerd Fürter, Christian Wagner, Uwe Gödecke, Henriette Müller
  • Projection exposure apparatus and exposure method
    Patent number: 6512573
    Abstract: The invention is directed to a projection exposure apparatus for the flat panel display manufacture having an objective array and magnifying objectives (O1 to O5).
    Type: Grant
    Filed: April 16, 2001
    Date of Patent: January 28, 2003
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Gerd Fürter
  • Catadioptric objective comprising two intermediate images
    Patent number: RE41350
    Abstract: An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a second partial objective, a second intermediate image, and a third partial objective. At least one of the partial objectives is purely refractive. One of the partial objectives is purely refractive and one is purely catoptric.
    Type: Grant
    Filed: July 15, 2005
    Date of Patent: May 25, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: David R. Shafer, Alois Herkommer, Karl-Heinz Schuster, Gerd Füerter, Rudolph Von Büenau, Wilhelm Ulrich