Abstract: A tungsten(VI) oxytetrachloride having a chemical purity of greater than 99.95%. The tungsten(VI) oxytetrachloride has a fraction of compounds selected from WCl6, WO2Cl2, WO3 and WO2, as defined as a ratio of a reflection having a highest intensity of one of WCl6, WO2Cl2, WO3 and WO2, (I(P2)100) in an x-ray diffraction pattern to a reflection having a highest intensity of the tungsten(VI) oxytetrachloride (I(WOCl4)100) in the x-ray diffraction pattern, expressed as I(P2)100/I(WOCl4)100, of less than 0.03.

Abstract: Process for producing a capacitor anode based on at least one of a valve metal and a compound having properties comparable to a valve metal includes providing a pressing or cutting tool which is at least one of made of and coated with a pressing or cutting tool material comprising at least one of a metal carbide, an oxide, a boride, a nitride, a silicide, a carbonitride or alloys thereof, a ceramic material, a hardened steel, an alloy steel, and a capacitor anode material. Particles of the at least one of a valve metal and a compound having properties comparable to a valve metal are pressed or cut with the pressing or cutting tool so as to produce a porous electrode body and form the capacitor anode.

Abstract: The present invention provides a new process for separating zirconium and hafnium compounds, in particular to remove traces of zirconium compounds from hafnium compounds, using fractional crystallisation, as well as hafnium compounds obtainable in accordance with this process.

Abstract: The present invention provides a new process for separating zirconium and hafnium compounds, in particular to remove traces of zirconium compounds from hafnium compounds, using fractional crystallisation, as well as hafnium compounds obtainable in accordance with this process.

Abstract: Backing plate for sputter targets made of a composite material which comprises 5 to 99 wt. % of at least one refractory metal from the group consisting of Mo, W, Re and Ta and 95 to 1 wt. % of at least one fuirther metallic component from the group consisting of Cu, Ag and Au, process for the production thereof and unit which comprises the backing plate and a sputter target.

Abstract: A process for producing hafnium(III) nitride (HfN) or zirconium nitride coatings by means of the CVD method (chemical vapour deposition) from a reactive gas on a substrate surface, the HfN coating or ZrN coating and their use are described. In the process, a hafnium or zirconium tetrakis(dialkylamide) having the general formula Hf(NR1R2)4 or Zr(NR1R2)4 wherein R1 and R2 denote identical or different, straight-chain or branched C1 to C4 alkyl radicals, is used as the Hf precursor or Zr precursor and a hydrazine derivative having the general formula H2N—NR3R4 wherein R3 denotes a straight-chain or branched C1 to C4 alkyl radical and R4 independently denotes a C1 to C4 alkyl radical or H, is used as the reactive gas.

Abstract: Provided is a novel high selectivity aqueous slurry composition method of utilizing same. The composition includes non-modified silica based abrasive particles in an amount of about 5 to about 50 weight percent, and an organic compound in an amount of about 0.001 to about 2.0 weight percent in an aqueous solution, wherein the silicon oxide to silicon nitride selectivity ratio ranges from about 50 to about 700.

Abstract: A composition for the chemical-mechanical polishing of metal and metal/dielectric structures, containing 7 to 100% by volume of a cationically stablilized silica sol which contains 30% by weight of SiO2 and the SiO2 particles of which have a mean particle size of less than 300 nm, with a pH of from 4 to 10, is distinguished by a TaN removal rate of ?40 nm per min and an improved barrier layer:metal selectivity of at least 2:1 or greater and a barrier layer:dielectric selectivity of at least 2:1 or above.

Abstract: A method for the preparation of nano size zinc oxide particles having an average primary particle diameter of less than or equal to 15 nm, which are redispersible in organic solvents and/or water, by basic hydrolysis of at least one zinc compound in alcohol or an alcohol/water mixture. The hydrolysis is carried out with substoichiometric amounts of base, based on the zinc compound. The precipitate which originally forms during hydrolysis is left to mature until the zinc oxide has completely flocculated. This precipitate is then thickened to give a gel and separated off from the supernatant phase.

Abstract: A composition containing −2.5 to 70% by volume of a 30% by weight cationically modified silica sol, the cationically modified SiO2 particles of which have a mean particle size of 12 to 300 nm, and 0.5 to 22% by weight of at least one oxidizing agent, with pH of 2.5 to 6, is eminently suitable as a polishing slurry for the chemical mechanical polishing of metal and metal/dielectric structures.

Abstract: A composition for the chemical-mechanical polishing of metal and metal/dielectric structures, containing 7 to 100% by volume of a cationically stablilized silica sol which contains 30% by weight of SiO2 and the SiO2 particles of which have a mean particle size of less than 300 nm, with a pH of from 4 to 10, is distinguished by a TaN removal rate of ≧40 nm per min and an improved barrier layer:metal selectivity of at least 2:1 or greater and a barrier layer:dielectric selectivity of at least 2:1 or above.

Abstract: The invention relates to anionically stabilized aqueous dispersions of nanoparticle zinc oxide having a mean primary particle diameter of ≦30 nm and a mean agglomerate size of ≦100 nm, wherein the surface of the zinc oxide particles at pH values of ≧7 has a negative charge and the content of nanoparticle zinc oxide in the dispersion is 0.01 to 30 wt. %, a process for their production, as well as their use as vulcanization activators for the vulcanization of latex molded articles.

Abstract: The invention relates to a polishing slurry for the chemical-mechanical polishing of metal and metal/dielectric structures, containing from about 2.5 to about 70% by volume of a silica sol which contains 15 to 40% by weight of SiO2 particles and is stabilized by H+ or K+ ions, wherein the SiO2 particles have a mean particle size of less than 300 nm, from about 6 to about 10% by volume of hydrogen peroxide and a base in a quantity which is appropriate to set the pH (22° C.) of the polishing slurry to from about 5 to about 1.5, has a Ta removal rate of >300 Å/min and an improved selectivity. Method for making and using such a slurry.

Abstract: The present invention relates to a method for manufacturing transition metal carbides and/or transition metal carbonitrides and the use thereof together with novel transition metal xerogels.

Abstract: A process for coating substrates with a silicon-containing protective layer by chemical vapor deposition with a silicon-containing compound of the structural formula (1): in which R1 is an alkyl group having 1 to 4 carbon atoms, and R2 is hydrogen or an alkyl group having 1 to 4 carbon atoms.

Abstract: This invention relates to amorphous fibers containing Si, B and N, to a process for the production thereof and to the use thereof, and to composites containing these amorphous fibers and the production thereof.

Abstract: The present invention relates to a process for the production of sintered materials comprising BN, sintering additives and at least one compound selected from the group consisting of Si.sub.3 N.sub.4 and SiAlON, wherein the BN component is present in the form of crystalline particles with an average particle size <2 .mu.m and the BN content amounts to between 0.1 and 34 vol-%. In the process, a single phase amorphous Si--B--N component with a specific surface <1.5 m/g and optionally Si.sub.3 N.sub.4 -powder is mixed with oxidic and/or nitridic sintering additives to form a mixture, the mixture is formed into a moulded article, and the moulded article is sintered at temperatures in the range from 1,450.degree. C. to 2,100.degree. C. in an atmosphere which contains N.sub..sub.2.

Abstract: Crack-free, dense and either amorphous or crystalline, nonoxide monolithic ceramic shaped articles are produced at relatively low temperatures, by shaping a powder (P) of an infusible, organometallic ceramic precursor polymer (Pi) into a green body having a relative density of at least 65%, and thence pyrolyzing such shaped green body.

Abstract: The present invention relates to an SiC powder suitable for the production of SiC sintered ceramics with compounds applied to its surface, these compounds being boron nitride and carbon; processes for production of the SiC powders; and the use of these powders to produce SiC sintered mouldings.