Patents by Inventor Gerd POHLERS

Gerd POHLERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresists and methods for use thereof
    Patent number: 9508553
    Abstract: New photoresists are provided that comprise a multi-keto component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride, hafnium silicate, zirconium silicate and other inorganic surfaces.
    Type: Grant
    Filed: December 30, 2011
    Date of Patent: November 29, 2016
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gerd Pohlers, Stefan J. Caporale
  • PHOTORESISTS AND METHODS FOR USE THEREOF
    Publication number: 20120199957
    Abstract: New photoresists are provided that comprise a multi-keto component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride, hafnium silicate, zirconium silicate and other inorganic surfaces.
    Type: Application
    Filed: December 30, 2011
    Publication date: August 9, 2012
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Gerd POHLERS, Stefan J. Caporale