Patents by Inventor Gerd Unger

Gerd Unger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7644389
    Abstract: A layout is decomposed into partial patterns. An intermediate mask is drawn for each of the partial patterns. The intermediate masks are used in a mask stepper or scanner progressively for projection again into a common pattern on a test mask. A line width distribution LB(x,y) is determined from the test mask or from a test wafer exposed using the mask, and is converted into a distribution of dose corrections. The transmission T(x,y) of the respective intermediate masks is adapted based upon the calculated dose correction. This can be achieved using additional optical elements which are assigned to the intermediate masks and have shading structure elements, or by laser-induced rear-side introduction of shading elements in the quartz substrate of the intermediate masks themselves.
    Type: Grant
    Filed: January 30, 2007
    Date of Patent: January 5, 2010
    Assignee: Qimonda AG
    Inventors: Mario Hennig, Rainer Pforr, Gerd Unger
  • Publication number: 20070196744
    Abstract: A layout is decomposed into partial patterns. An intermediate mask is drawn for each of the partial patterns. The intermediate masks are used in a mask stepper or scanner progressively for projection again into a common pattern on a test mask. A line width distribution LB(x,y) is determined from the test mask or from a test wafer exposed using the mask, and is converted into a distribution of dose corrections. The transmission T(x,y) of the respective intermediate masks is adapted based upon the calculated dose correction. This can be achieved using additional optical elements which are assigned to the intermediate masks and have shading structure elements, or by laser-induced rear-side introduction of shading elements in the quartz substrate of the intermediate masks themselves.
    Type: Application
    Filed: January 30, 2007
    Publication date: August 23, 2007
    Applicant: Qimonda AG
    Inventors: Mario Hennig, Rainer Pforr, Gerd Unger
  • Patent number: 6972832
    Abstract: A retaining device for photo blanks, comprising a retaining member (1) with a supporting surface (3) for a photo blank (4) and a ground element (10) which can be brought into contact with an electroconductive layer (6) of said photo blank. The ground element is provided with a contact tip (15) which can be manipulated in such a way that it can be lowered substantially onto the photo blank (4) without any lateral movement in relation to said photo blank which is inserted into the retaining device.
    Type: Grant
    Filed: September 13, 2000
    Date of Patent: December 6, 2005
    Assignee: Infineon Technologies AG
    Inventors: Gernot Gödl, Andreas Oelmann, Gerd Unger, Wolfgang Besenböck, Alois Reiter